No abstract

In this work, a masking technique was used to improve the thickness uniformity of a Mo/Si multilayer deposited on a curved spherical mirror by direct current (DC) magnetron sputtering with planetary rotation stages. The clear aperture of the mirror was 125 mm with a radius of curvature equal to 143.82 mm. Two different shadow masks were prepared; one was flat and the other was oblique. When using the flat mask, the non-uniformity considerably increased owing to the relatively large gap between the mask and substrate. The deviation between the designed and measured layer thickness and non-uniformity gradually reduced with a smaller gap. The second mask was designed with an oblique profile. Using the oblique mask, the deviation from multilayer thickness uniformity was substantially reduced to a magnitude below 0.8% on the curved spherical substrate over the clear aperture of 125 mm. Multilayers still achieved a smooth growth when deposited with obliquely incident particles. The facile masking technique proposed in this study can be used for depositing uniform coatings on curved spherical substrates with large numerical apertures for high-resolution microscopes, telescopes, and other related optical systems.

High-resolution X-ray flash radiography of Ti characteristic lines with a multilayer Kirkpatrick-Baez microscope was developed on the Shenguang-II Update (SG-Ⅱ Update) laser facility. The microscope uses an optimized multilayer design of Co/C and W/C stacks to obtain a high reflection efficiency of the Ti characteristic lines while meeting the precise alignment requirement at the Cu Kα line. The alignment method based on dual simulated balls was proposed herein, which simultaneously realizes an accurate indication of the center field of view and the backlighter position. The optical design, multilayer coatings, and alignment method of the microscope and the experimental result of Ti flash radiography of the Au-coned CH shell target on the SG-II Update are described.

Lithium fluoride (LiF) crystal is a radiation sensitive material widely used as EUV and soft x-ray detector. The LiF-based detector has high resolution, in principle limited by the point defect size, large field of view, and wide dynamic range. Using LiF crystal as an imaging detector, a resolution of 900 nm was achieved by a projection imaging of test meshes with a Schwarzschild objective operating at 13.5 nm. In addition, by imaging of a pinhole illuminated by the plasma, an EUV spot of 1.5 μm diameter in the image plane of the objective was generated, which accomplished direct writing of color centers with resolution of 800 nm. In order to avoid sample damage and contamination due to the influence of huge debris flux produced by the plasma source, a spherical normal-incidence condenser was used to collect EUV radiation. Together with a description of experimental results, the development of the Schwarzschild objective, the influence of condenser on energy density and the alignment of the imaging system are also reported.

High-resolution x-ray imaging diagnostics play a crucial role in fundamental research, such as inertial confinement fusion (ICF) and high-energy density physics (HEDP). Plasma signals are typically characterized by small scales, rapid evolution, and spectral complexity. These characteristics make it essential to develop x-ray diagnostics optics with high spatial resolution, collection efficiency, and spectral resolution. These requirements can be met using a combination of a high-resolution multi-channel Kirkpatrick–Baez (KB) microscope with spectrum-resolved multilayers and a time-resolved framing camera. This study describes the optical and multilayer design of a dual-energy sixteen-channel KB microscope. The calibrated results of online and offline imaging are shown. By utilizing a dual-energy multi-channel KB microscope, high-resolution backlighting and self-emission x-ray imaging can be realized and detailed information related to plasma density and temperature can be simultaneously obtained.