In the present work, optically thick nanostructured titanium (Ti) films of thickness ranging from ∼100 to 900 nm were deposited on a glass substrate by DC magnetron sputtering at room temperature. Microstructural and surface properties of the samples were studied by x-ray diffraction and x-ray photoelectron spectroscopy (XPS). The morphological results revealed a systematic normal grain growth mechanism with increasing thickness analyzed by a scanning electron microscope. The influence of thickness on film surface roughness has been investigated by atomic force microscopy (AFM). The optical dispersion behavior was examined by spectroscopic ellipsometry (SE) over the long wavelength range of 246-1688 nm. The experimentally observed SE parameters were theoretically fitted with Drude-Lorentz and Bruggeman effective medium approximation theory. The surface properties of the Ti film measured by XPS and AFM were further accounted for in the optical model to determine optical constants (n and k) and the obtained results are expected to be the best available for bulk Ti metal.
Highly ordered and hydrophobic zinc oxide thin films have been synthesized by dc magnetron sputtering on the glass substrates at room temperature (RT). We have determined the influence of deposition parameters on the optical and other physical properties of the films, and the correlation between their microstructural and optical properties. Films have preferred (002) orientation, an average crystallite size ≤26 nm, and rms surface roughness ≤14 nm. The water contact angle of 120° exceeds previous measurements by over 10°–20°. Dispersion of the refractive index is analyzed in terms of the Wemple-DiDomenical single-oscillator model, and the third-order nonlinear optical parameters are calculated using the Tichy and Ticha relation. Refractive indices of 1.9686 at 540 nm are near the bulk value of 2.0041. Produced at RT, these highly ordered films may be promising candidates for compact optoelectronic devices.
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