The formation of carbon structures as a result of decomposition of some organic molecules on the surface of metal fluorides (without molecular decay in a gas) exposed to IR femtosecond laser radiation with a wavelength of 3.3-5.4 µm is revealed. The determining influence of the laser pulse intensity on the efficiency of the decomposition process has been ascertained. A possible mechanism of the decomposition of molecules on the surface and of the growth of carbon structures has been proposed.
This study relates to the formation of carbon and silicon dioxide films that occurs as a result of the decomposition of organic and silicon-containing molecules on the surface of ionic crystals under IR femtosecond laser radiation of moderate intensity (~10 11 W cm −2 ) without molecular decomposition in the gas phase. We found that transparent graphite oxide films formed in the case of CO 2 molecule decomposition.
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