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We present research investigations in the eld of multilayer optics in X-ray and extreme ultra-violet ranges (XUV), aimed at the development of optical elements for applications in experiments in physics and in scienti c instrumentation. We discuss normal incidence multilayer optics in the spectral region of \water window", multilayer optics for collimation and focusing of hard X-rays, multilayer dispersing elements for X-ray spectroscopy of high-temperature plasma, multilayer dispersing elements for analysis of low Z-elements. Our research pays special attention to optimization of multilayer optics for projection EUV-lithography ( ¶ = 13nm) and short period multilayer optics.

A system with two interacting plasma fluxes for the deposition of high-temperature superconductor films is presented. This system prevents the appearance of particles on a film surface, and permits one to obtain YBa2Cu3O7−x films with the surface defect concentration as low as 104 cm−2, a high critical temperature of 90 K, and a critical current density of 4×106 A/cm2 at 77 K. It is shown that high morphological quality films are obtained at a specific target-substrate distance.

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