Articles you may be interested inIn situ GaN decomposition analysis by quadrupole mass spectrometry and reflection high-energy electron diffraction J. Appl. Phys.

Zinc-blende GaN layers grown by molecular beam epitaxy were uniformly focused-ion-beam implanted with 300keV Gd3+ ions for doses ranging from 1×1012to1×1015cm−2, and their structural and magnetic properties were studied. The implanted samples were not subjected to any annealing treatment. Only Gd incorporation into zinc-blende GaN was observed by x-ray diffraction. Magnetic investigations using superconducting quantum interference device magnetometry reveal a (super)paramagneticlike behavior with an ordering temperature around 60K for the sample with the highest implantation dose. Our experimental studies indicate that the spontaneous electric polarization in wurtzite GaN is the crucial mechanism for its ferromagneticlike behavior upon Gd doping.

In this contribution the authors studied the optical properties of cubic Al x Ga 1−x N / GaN single and multiple quantum wells. The well widths ranged from 2.5 to 7.5 nm. Samples were grown by rf-plasma assisted molecular beam epitaxy on free standing 3C-SiC ͑001͒ substrates. During growth of Al 0.15 Ga 0.85 N / GaN quantum wells clear reflection high energy electron diffraction oscillations were observed indicating a two dimensional growth mode. They observe strong room temperature, ultraviolet photoluminescence at about 3.3 eV with a minimum linewidth of 90 meV. The peak energy of the emission versus well width is reproduced by a square-well Poisson-Schrödinger model calculation.

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