A quantum theory of cosmological perturbations is based on the action of Einstein gravity with matter expanded io quadratic order around a background solution of the field equations. If, in the Schriidinger picture, the wavefunction is assumed lo factorize such that each faclor is a function of only a finite number of degrees of freedom (e.g. Fourier wmponenls of the fields) all gauge constrain& can be solved explicitly. This generalizes previous gaugehvarianl quantizarions while clarifying their Limited soape. The result is cast into the more wnvenient Heisenberg picture. It can be found directly from the Lapgian, the Hamiltonian approach serving only as a justification. The wncepi of a Fock vacuum is generalized to several linear but coupled degrees of freedom.PACS number: 9880

The charge properties of thin dielectrics, obtained by rapid thermal processing (RTP), and their interfaces with silicon for MOS transistors are investigated. The production of insulator layers was carried out by a two- or three-stage RTP with photon processing regimes similar for each stage (duration – 12 s, maximum temperature – 1250 °C). After the third stage of RTP in a nitrogen atmosphere of the gate oxides, obtained by a two-stage process in oxygen atmosphere, the defects responsible for local charge centers are partially eliminated. There is also an increase in the relative value of the surface potential by an average of 100 relative units. The elimination of defects is a consequence of the rearrangement of the structure of the dielectric, its interface with silicon, and the diffusion of oxygen and silicon atoms along the interface of the insulator layer. For samples obtained by a two-stage RTP in an oxygen atmosphere and subjected to the third stage of processing in a forming gas, there is an almost complete elimination of local charge centers and an increase in the relative value of the surface potential by an average of 300 relative units. In this case, in addition to the processes occurring during the treatment of SiO2 by the RTP method in an nitrogen atmosphere, the liquidation of charge centers is a consequence of the passivation of defects by hydrogen atoms.

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Emission of the silicon oxide films grown on Si by wet thermal oxidation at 900 °С and by plasma-enhanced chemical vapor deposition from the SiH4 + N2O mixture at 350 °С has been compared using electroluminescence. The electroluminescence spectra were recorded in electrolyte – insulator – semiconductor system. The intense band in the red range with a maximum at 1.9 eV dominates the electroluminescence spectrum of the thermal oxide film. It was concluded that this band is related with the existence of silanol groups (Si — OH) in the oxide matrix. Multiband emission in the UV range is observed in the electroluminescence spectrum of the oxide film formed by plasma-enhanced chemical vapor deposition. Additional investigations using IR and RS spectroscopy revealed that observed spectrum modulation is of an oscillatory nature and is not the result of interference. Presumably, the luminescence in the UV region is due to the presence of oxygen deficiency centers containing bonds with hydrogen atoms.

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