The Co(N'acN'ac) 2 complex, namely bis(2-methylamino-4-methyliminato-penten) cobalt(II), was for the first time used as a precursor for producing Co films via metal-organic chemical vapour deposition. This chelate exhibits good volatility ln (P/Pu)526?45-14006?7/T(K) at moderate temperature values (382-427 K). Co films were grown on Si (100) substrates and studied by Xray diffraction, extended X-ray absorption fine structure, atomic force and scanning electron microscopy, energy dispersive X-ray analysis and optical profilometry. Deposition conditions corresponding to the optimal electrical and magnetic characteristics of Co thin films are found.
The paper presents a study of the ultrasonic impact treatment effect on the microstructure and mechanical properties of commercial purity titanium (CP-Ti). The texture, residual stresses, the size of coherent scattering region, the thickness of plastic deformation layer and the microhardness of CP-Ti specimens subjected to ultrasonic impact treatment were studied. It was found that ultrasonic impact treatment of CP-Ti specimens resulted in severe plastic deformation of their surface layer. The plastic deformation caused twin and low angle boundary formation in the surface layer. The last-named led to a crystallographic texture change, a decrease in the size of coherent scattering region, an increase in compressive residual stresses and a growth of microhardness of the surface layer of titanium specimens.
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