By means of a tensimetric flow method and a static method with a silica-membrane zero gauge, the dependence of vapour pressure on temperature was obtained for tds(2,4-pentanedionato)ruthenium(lll), Ru(aa)3, and tris(1,1,l-trifluoropentane-2,4-dionato)ruthenium(IlI), Ru(tfa)3. The thermodynamic characteristics of vaporization and sublimation of these complexes were determined. The processes of thermal decomposition of the vapour of the compounds in vacuum, hydrogen and oxygen were investigated by using mass spectrometry in the temperature range 170-550~ for Ru(aa)3 and 150--620~ for Ru(tfa)3. The threshold temperatures of the stability of the vapour of the complexes and the rate constants of the thermolysis processes were determined. The main gaseous products of the thermal decomposition and the dependences of their composition on the presence of hydrogen and oxygen were established.
A study of the thermal behavior of Ti(dpm) 2 (O i Pr) 2 , used as a source compound to obtain TiO 2 films, was carried out. Ti(dpm) 2 (O i Pr) 2 was synthesized by an original technique. Data on vapor pressure and composition, thermal stability, and decomposition products of the compound were obtained, both in vacuo and in the presence of oxygen. A mechanism is suggested for the thermal decomposition of a vapor on a hot surface.
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