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In this paper, we report on rf power induced change in the structural and optical properties of nickel oxide (NiO) thin films deposited onto glass substrates by rf magnetron sputtering technique. The crystallinity of the film was found to increase with increasing rf power and the deposited film belong to cubic phase. The maximum optical transmittance of 95% was observed for the film deposited at 100 W. The slight shift in transmission threshold towards higher wavelength region with increasing rf power revealed the systematic reduction in optical energy band gap (3.93 to 3.12 eV) of the films. The dispersion curve of the refractive index shows an anomalous dispersion in the absorption region and a normal dispersion in the transparent region. It was observed that the dispersion data obeyed the single oscillator of the Wemple-Didomenico model, from which the dispersion parameters, dielectric constants, relaxation time, and optical non-linear susceptibility were evaluated. We have made an attempt to discuss and correlate these results with the light of possible mechanisms underlying the phenomena.

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Electrochromic thin films of tungsten oxide (WO 3 ) were prepared on transparent conducting oxide substrates, i.e., fluorine doped tin oxide coated (FTO or SnO 2 :F) glass and microscopic glass substrates by the electron beam evaporation technique using pure WO 3 (99.99%) pellets at various substrate temperatures (i.e., T sub = room temperature (RT, 30 • C), 100 • C and 200 • C). The films were prepared under vacuum of the order of 1 × 10 −5 mbar. The room temperature prepared films were further post-heat-treated (T anne ) at 200 and 300 • C for about 1 h in the vacuum environment. The prepared films are in monoclinic phase. The chemical composition has been characterized by using the XPS technique. The W 4f and O 1s core levels of WO 3 films have been studied on the samples. The obtained core level binding energies revealed the WO 3 films contained six-valent tungsten (W 6+ ). The electrochemical nature of the films was studied by a three-electrode electrochemical cell in the configuration of FTO/WO 3 /H 2 SO 4 /Pt, SCE, using the cyclic voltammetry (CV) technique. Electrochromic devices (ECDs) of the general type FTO/WO 3 /electrolyte/FTO were studied. The films produced at higher substrate temperature show smaller modulation of the visible spectrum, compared with the films produced at lower temperatures. The significant chemical bonding nature associated with the coloring/bleaching process which follows the H + ion incorporation in the film is studied by FTIR analysis. The W-O-W framework peak was observed at 563 cm −1 and confirms the stability of the films in the electrochemical analysis. The results obtained from cyclic voltammetry technique and ECD cell characterization are used to emphasize the suitability for some applications of the solar control systems.

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