The B2.5-Eunomia code is used to simulate the plasma and neutral species in and around a Pilot-PSI plasma beam. B2.5, part of the SOLPS5.0 code package, is a multi-fluid plasma code for the scrape-off layer. Eunomia is a newly developed non-linear Monte Carlo transport code that solves the neutral equilibrium, given a background plasma. Eunomia is developed to simulate the relevant neutral species in Pilot-PSI and Magnum-PSI, linear devices that study plasma surface interactions in conditions expected in the ITER divertor. Results show the influence of the neutral species on the Pilot-PSI plasma beam. We show that a fluid description for the neutrals is not sufficient and Eunomia is needed to describe Pilot-PSI. The treatment of individual vibrational states of molecular hydrogen as separate species is crucial to match the experiment.

The Eunomia code is used to study the neutral species in and near a hydrogen plasma beam. Eunomia is a non-linear Monte Carlo transport code that solves the neutral equilibrium, given a fixed background plasma. The code is developed to study the neutral inventory of Pilot-PSI and Magnum-PSI, linear devices developed to study plasma surface interactions in similar conditions as expected in the ITER divertor. Results show the influence of elastic collisions and the outer vessel wall on the neutral species. In the center of the 2 cm diameter Pilot-PSI beam the results show a strong coupling to the plasma. Only millimeters away from the center, the neutral flow, temperature and density are strongly influenced by recombination processes at the vessel wall.

We present a kinetic simulation of the plasma formed by photoionization in the intense flux of an extreme ultraviolet lithography (EUVL) light source. The model is based on the particle-in-cell plus Monte Carlo approach. The photoelectric effect and ionization by electron collisions are included. The time evolution of the low density argon plasma is simulated during and after the EUV pulse and the ion-induced sputtering of the coating material of a normal incidence collector mirror is computed. The relation between the time and position at which the ions are created and their final energy is studied, revealing how the evolution and the properties of the sheath influence the amount of sputtered material. The influence of the gas pressure and the source intensity is studied, evaluating the behavior of Ar+ and Ar2+ ions. A way to reduce the damage to the collector mirror is presented.

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A Particle-in-Cell Monte Carlo model is used to simulate extreme ultraviolet driven plasma. In an extreme ultraviolet lithography tool, photons of a pulsed discharge source will ionize a low pressure argon gas by photoionization. Together with the photoelectric effect, this results in a strongly time dependent and low density plasma, which is potentially dangerous to the optical elements, the collector in particular. Plasma sheaths will develop and ions are accelerated towards the collector, which might lead to sputtering. A spherical geometry is used to study the plasma between the point source and collector. Simulations are performed to study the influence of background pressure and source intensity on the damage to the collector by sputtering.