Plasma-induced damage of multilayer coatings in EUVL

Wieggers, R. C.; Goedheer, W. J.; Louis, Eric; Bijkerk, F.

doi:10.1117/12.724889

Cited by 6 publications

(3 citation statements)

References 9 publications

(2 reference statements)

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“…The PIC method allows for accommodating an arbitrary shape of the energy distribution function against reasonable computational costs. To the authors' knowledge, the first PIC modelling of EUV-induced plasmas was performed by Wieggers, Goedheer and Louis [20]. These authors used one-dimensional (1D) particle-in-cell codes and estimated the damage to a multilayer mirror (MLM) due to physical sputtering.…”

Section: Recent Numerical Work On Euv-induced Bulk Plasmasmentioning

confidence: 99%

EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology

et al. 2019

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After a long period of relatively low interest, science related to effects in the Extreme Ultraviolet (EUV) spectrum range experienced an explosive boom of publications in the last decades. A new application of EUV in lithography was the reason for such a growth. Naturally, an intensive development in such area produces a snowball effect of relatively uncharted phenomena. EUV-induced plasma is one of those. While being produced in the volume of a rarefied gas, it has a direct impact onto optical surfaces and construction materials of lithography machines, and thus has not only scientific peculiarity, but it is also of major interest for the technological application. The current article provides an overview of the existing knowledge regarding EUV-induced plasma characteristics. It describes common, as well as distinguishing, features of it in comparison with other plasmas and discusses its interaction with solid materials. This article will also identify the gaps in the existing knowledge and it will propose ways to bridge them.

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Section: Recent Numerical Work On Euv-induced Bulk Plasmasmentioning

confidence: 99%

EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology

et al. 2019

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“…In recent years, many researchers have dedicated their work to understanding the dynamic behavior of EUVinduced plasma and its impact on the performance of EUV lithography equipment. For example, van der Velden et al [4] numerically studied the characteristics of EUV-induced argon (Ar) plasma near multilayer mirrors. Their results suggested that the energy of Ar + ions may exceed the physical sputtering threshold of the mirror surface, and potentially cause damage to the mirror.…”

Section: Introductionmentioning

confidence: 99%

Particle-in-cell simulations of EUV-induced hydrogen plasma in the vicinity of a reflective mirror

ZHANG 张,

YU 余,

YE 叶

2024

Plasma Sci. Technol.

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Particle-In-Cell (PIC) simulations were performed in this work to study the dynamics of the EUV induced hydrogen plasma. Monte-Carlo Collision (MCC) model was employed to deal with the collisions between charged particles and background gas molecules. The dynamic evolution of the plasma sheath, as well as the flux and energy distribution of ions impact on the mirror surface, was discussed. It was found that the emission of secondary electrons under the EUV irradiation on the ruthenium coating of mirrors creates a positively charged wall and then prevents the ion from impacting onto the mirror and therefore changes the flux and energy distribution of ions reach the mirror. Furthermore, gas pressure has notable effect on the plasma sheath and the characteristics of the ions impinging on the mirrors. With greater gas pressure, the sheath potential decreases more rapidly. The flux of ions received by the mirror grows approximately linearly and the energy corresponding to the peak flux decreases slightly in the meantime. Meanwhile, EUV source intensity barely changes the sheath potential and its influence on the ion impact is mainly limited to the approximate linear increase of ion flux.

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“…17 EUV induced plasmas have been considered in 1D with argon as background gas [22], [23]. We did not use this work as a starting point, because we need to deal with hydrogen in 2D.…”

Section: "Why a New Code"mentioning

confidence: 99%

Numerical study of extreme-ultra-violet generated plasmas in hydrogen

Astakhov¹

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Plasma probe characteristics in low density hydrogen pulsed plasmas, Plasma Sources Sci. Technol. 24, 055018 (2015). Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen, submied Chapter 7 D.I. Astakhov, W.J. Goedheer, C.J. Lee, V.V. Ivanov, V.M. Krivtsun, O. Yakushev, K.N. Koshelev, D. V. Lopaev, and F. Bijkerk, Numerical and experimental studies of the carbon etching in EUV-induced plasma, submiedis work is part of the research programme 'Controlling photon and plasma induced processes at EUV optical surfaces (CP3E)' of the 'Stichting voor Fundamenteel Onderzoek der Materie (FOM)', which is financially supported by the 'Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO)'. e CP3E programme is co-financed by Carl Zeiss SMT and ASML. We also acknowledge financial support from Agentschap NL (EXEPT project). Aknowledgments 109 Curriculum vitae 110Bibliography 112 Краткое содержаниеДанная работа посвящена численному моделированию динамики плазмы в водороде, индуцированной мягким рентгеновским излучением. Такую плазму возможно использовать для очистки (и поддержания чистоты) поверхности оптических элементов используемых в установках проекционной литографии в диапазоне мягкого рентгена, что обуславливает актуальность данной задачи. Для моделирования плазмы использовался метод частиц в ячейках в двумерной, цилиндрически симметричной постановке. Такой подход позволил получить количественные оценки для различных величин, измеряемых в эксперименте(например, ток, прошедший через электрод), и соотнести их с параметрами плазмы, полученными в результате моделирования. Для проверки точности модели были проведены тестовые расчеты, в которых проверяли, воспроизводит ли модель результаты экспериментов с дрейфовыми трубами (см. главу 2, раздел 2.8).Следующим шагом был проведен расчет зондовой характеристики, измеренной в установке, в которой водородная плазма образовывалась в результате развития электронной лавины (см. главу 5). Конфигурация эксперимента была осе-симметричной, что позволило самосогласованно учесть влияние цилиндрического зонда на формирование плазмы. Результаты расчетов и измерений тока на зонд совпали с достаточной точностью, однако параметры плазмы полученные в расчете существенно разошлись с таковыми из анализа зондовой характеристики с помощью стандартных зондовых теорий. Эти различия указывают на то, что стандартные методы анализа зондовых характеристик в случае импульсных плазм должны применяться с осторожностью, и разница между предсказаниями разных моделей отклика зонда может трактоваться как оценка погрешности определения характеристик плазмы.Успешное моделирование эксперимента с электронной лавиной позволило перейти к более сложному случаю, и рассмотреть формирование плазмы в газе из-за поглощения мягкого рентгеновского излучения. Введение излучения в модель привело к появлению большого количества плохо определенных параметров, таких как интенсивность излучения, временная, пространственная и спектральная форма импульса излучения и т....

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Plasma-induced damage of multilayer coatings in EUVL

Cited by 6 publications

References 9 publications

EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology

EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology

Particle-in-cell simulations of EUV-induced hydrogen plasma in the vicinity of a reflective mirror

Numerical study of extreme-ultra-violet generated plasmas in hydrogen

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