This letter reports a two-step growth process for improving microstructural quality of semipolar (112̱2) GaN on nitridized m-plane sapphire. The two-step growth of (112̱2) GaN, islanding growth under high pressure followed by islands coalescence under low pressure, went through a roughening-recovery process, which was found very effective in reducing the density of stacking faults and dislocations in (112̱2) GaN. The x-ray rocking curves of both on-axis and off-axis planes were narrowed down by more than 50%. The improvement of GaN quality was confirmed by a boost in blue and green optical output of semipolar (112̱2) InGaN/GaN quantum wells.
In this paper we provide explanations to the complex growth phenomena of GaN heteroepitaxy on nonpolar orientations using the concept of kinetic Wulff plots (or v-plots). Quantitative mapping of kinetic Wulff plots in polar, semipolar, and nonpolar angles are achieved using a differential measurement technique from selective area growth. An accurate knowledge of the topography of kinetic Wulff plots serves as an important stepping stone toward model-based control of nonpolar GaN growth. Examples are illustrated to correlate growth dynamics based on the kinetic Wulff plots with commonly observed features, including anisotropic nucleation islands, highly striated surfaces, and pentagonal or triangular pits.
This work represents a comprehensive attempt to correlate the heteroepitaxial dynamics in experiments with fundamental principles in crystal growth using the kinetic Wulff plot (or v-plot). Selective area growth is employed to monitor the advances of convex and concave facets toward the construction of a comprehensive v-plot as a guidepost for GaN heteroepitaxy. A procedure is developed to apply the experimentally determined kinetic Wulff plots to the interpretation and the design of evolution dynamics in nucleation and island coalescence. This procedure offers a cohesive and rational model for GaN heteroepitaxy on polar, nonpolar, and semipolar orientations and is broadly extensible to other heteroepitaxial material systems. We demonstrate furthermore that the control of morphological evolution, based on invoking a detailed knowledge of the v-plots, holds a key to the reduction of microstructural defects through effective bending of dislocations and geometrical blocking of stacking faults, paving a way to device-quality heteroepitaxial nonpolar and semipolar GaN materials.
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