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Oxide scales formed on metals at elevated temperatures may be different, both chemically and structurally, from the scales on the metal once it has cooled to room temperature. This paper discusses Raman spectroscopy instrumentation for the in-situ identification of scales formed on metal surfaces exposed to gaseous environments. The results of an experimental program to characterize scales formed on two commercial iron-chromium alloys, AISI 446 and 502, in air and oxygen environments are also presented.

Chromium nitride films were deposited on glass substrates using reactive dc planar magnetron sputtering. Film stress-state evaluation permitted a two-level classification into compressive and transition categories. Maximum stress levels in these compressive category films were in the (−) 0.83 to (−) 14.4 GPa range. Sputtering parameter weighting equations indicated the deposition parameters which influenced stress were sputtering pressure, sputtered flux incidence angle, film thickness, and the interactions between these parameters. Subsequent studies indicated substrate bias to be important in the −50 to −250 V interval. Thermal stresses contributed a compressive component of (−) 0.7 GPa which was approximately 4% of the peak compressive stress. Generally, deposition conditions promoting high normalized energies (energetic particle bombardment of the film) produced hard coatings which were highly stressed (compressive) with low resistivities.

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