This report was prepared as an account of work sponsored by the United States Government. AbstractThe hotside operating temperatures for many projected thennophotovoltaic (TPV) conversion system applications are approximately 10oO 'C, which sets an upper limit on the TPV diode bandgap of 0.6 eV from efficiency and power density considerations. This bandgap requirement has necessitated the development of new diode material systems, never previously considered for energy generation. To date, InGaAsSb quaternary diodes grown lattice-matched on GaSb substrates have achieved the highest performance. This report relates observed diode performance to electrooptic properties such as minority carrier lifetime, diffusion length and mobility and provides initial links to microstructural properties. This analysis has bounded potential diode performance improvements. For the 0.52 eV InGaAsSb diodes used in this analysis the measured dark current is 2 x Ncm2 (no photon recycling), and an absolute thermodynamic limit of 1.4 x A/cm2. These dark currents are equivalent to open circuit voltage gains of 20 mV (7%), 60 mV (20%) and 140 mV (45%), respectively.
This report presents an assessment of the efficiency and power density limitations of thermophotovoltaic (TPV) energy conversion systems for both ideal (radiative-limited) and practical (defect-limited) systems. Thermodynamics is integrated into the unique process physics of TPV conversion, and used to define the intrinsic tradeoff between power density and efficiency. The results of the analysis reveal that the selection of diode bandgap sets a limit on achievable efficiency well below the traditional Carnot level. In addition it is shown that filter performance dominates diode performance in any practical TPV system and determines the optimum bandgap for a given radiator temperature. It is demonstrated that for a given radiator temperature, lower bandgap diodes enable both higher efficiency and power density when spectral control limitations are included. The goal of this work is to provide a better understanding of the basic system limitations that will enable successfiil long-term development of TPV energy conversion technology.
Transient radio frequency photoreflectance measurements were performed on 0.53 eV p-type InGaAsSb double heterostructures, grown by organometallic vapor phase epitaxy on lattice matched GaSb substrates, for determining excess carrier lifetime. Direct evidence of photon recycling was observed by changing the GaSb backsurface reflectivity and observing the change in excess carrier lifetime. Consistent with theory developed for this type of structure, effective lifetimes increased by 30%-40% when the backsurface was changed from an absorbing to a reflecting surface. The theory develops a closed-form expression for the total radiative recombination rate, starting with continuity equations for both excess minority carriers and the photon density. Lifetime measurements in these p-InGaAsSb structures with different doping concentrations and epitaxial layer thicknesses allow the extraction of minority carrier recombination parameters. Measurements indicate a value for the radiative recombination coefficient of Bϭ5 -6ϫ10 Ϫ11 cm 3 /s, for the Auger recombination coefficient of Cϭ2 -5ϫ10 Ϫ29 cm 6 /s, for the Shockley-Read-Hall lifetime of 100-150 ns and for the surface recombination velocity of 1 -2ϫ10 3 cm/s.
Degenerately doped (>1019 cm−3) n-type InxGa1−xAs (x∼0.67) and InPyAs1−y (y∼0.65) possess a number of intriguing electrical and optical properties relevant to electro-optic devices and thermophotovoltaic devices in particular. Due to the low electron effective mass of these materials (m*<0.2) and the demonstrated ability to incorporate n-type dopants into the high 1019 cm−3 range, both the Moss–Burstein band gap shift and plasma reflection characteristics are particularly dramatic. For InGaAs films with a nominal undoped band gap of 0.6 eV and N=5×1019 cm−3, the fundamental absorption edge increased to 1.27 eV. InPAs films exhibit a shorter plasma wavelength (λp∼5 μm) in comparison to InGaAs films (λp∼6 μm) with similar doping concentrations. The behavior of the plasma wavelength and the fundamental absorption edge are investigated in terms of conduction band nonparabolicity and Γ-L valley separation using detailed band structure measurements and calculations.
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