An indefinite permittivity medium (IPM) has been fabricated and optically characterized in mid-infrared spectral range (10.7 µm-11.3 µm). Phase and amplitude transmission measurements reveal two remarkable properties of IPMs: (i) transmission of sub-diffraction waves (as short as λ/4) can exceed those of diffraction-limited ones, and (ii) sub-diffraction waves can propagate with negative refractive index. We describe a novel double-detector optical technique relying on the interference between sub-diffraction and diffraction-limited waves for accurate measurement of the transmission amplitude and phase of the former.

Thin (6–7 nm) SiO2 layers were thermally grown onto cubic silicon carbide (3C-SiC) heteroepitaxial layers of different surface roughness and with different types of near-surface epitaxial defects. Localized dielectric breakdown (BD) was studied by electrically stressing the system using conductive atomic force microscopy (C-AFM), which constitutes a means to directly and simultaneously observe localized dielectric failure as a function of stress time and surface morphology with nanoscale lateral resolution. AFM and scanning capacitance microscopy (SCM) were used to monitor defects and the morphological and capacitive uniformities of the SiO2, respectively, while capacitance-voltage (C-V) measurements were used to evaluate the presence of charges and traps in the oxide layers. The BD kinetics was evaluated by fitting the experimental failure ratios as a function of the stress time to the failure probability described by Weibull statistics, in turn allowing a distinction to be made between defect-induced (extrinsic) and intrinsic dielectric BD events. The results give useful information about how morphological features at the 3C-SiC surface as well as trapped charges influence the BD generation in thermally grown oxides on this polytype.

We demonstrate for the first time the efficient mechanical-electrical conversion properties of InGaN/GaN nanowires (NWs). Using an atomic force microscope equipped with a modified Resiscope module, we analyse the piezoelectric energy generation of GaN NWs and demonstrate an important enhancement when integrating in their volume a thick In-rich InGaN insertion. The piezoelectric response of InGaN/GaN NWs can be tuned as a function of the InGaN insertion thickness and position in the NW volume. The energy harvesting is favoured by the presence of a PtSi/GaN Schottky diode which allows to efficiently collect the piezo-charges generated by InGaN/GaN NWs. Average output voltages up to 330 ± 70 mV and a maximum value of 470 mV per NW has been measured for nanostructures integrating 70 nm-thick InGaN insertion capped with a thin GaN top layer. This latter value establishes an increase of about 35% of the piezo-conversion capacity in comparison with binary p-doped GaN NWs. Based on the measured output signals, we estimate that one layer of dense InGaN/GaN-based NW can generate a maximum output power density of about 3.3 W/cm2. These results settle the new state-of-the-art for piezo-generation from GaN-based NWs and offer a promising perspective for extending the performances of the piezoelectric sources.