Due to the importance of errors in lithography scanners, masks, and computational lithography in low-k1 lithography, application software is used to simultaneously reduce them. We have developed "Masters" application software, which is all-inclusive term of critical dimension uniformity (CDU), optical proximity effect (OPE), overlay (OVL), lens control (LNS), tool maintenance (MNT) and source optimization for wide process window (SO), for compensation of the issues on imaging and overlay.In this paper, we describe the more accurate and comprehensive solution of OPE-Master, LNS-Master and SO-Master with functions of analysis, prediction and optimization. Since OPE-Master employed a rigorous simulation, a root cause of error in OPE matching was found out. From the analysis, we had developed an additional knob and evaluated a proofof-concept for the improvement. Influence of thermal issues on projection optics is evaluated with a heating prediction, and an optimization with scanner knobs on an optimized source taken into account mask 3D effect for obtaining usable process window. Furthermore, we discuss a possibility of correction for reticle expansion by heating comparing calculation and measurement.
Synchrotron X‐ray experiments on magnetic circular dichroism (XMCD) have been performed at Co K and Fe K absorption edges for CoFe2O4, Fe1.5Co1.5O4 and FeCo2O4 with the spinel structure. The XANES studies have clarified that only Fe3+ exists in all compounds and Co2+ and Co3+ coexist in the latter two cobaltites. A systematic change in XMCD spectra has concluded that the Co2+ ions in the B sites of FeCo2O4 are in the low‐spin state. Since the Co2+ ions in CoFe2O4 are in the high‐spin state, the spectra of the intermediate cobaltite may be explained as a mixture of low‐spin and high‐spin states.
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