Application of illumination pupilgram control method with freeform illumination

Matsuyama, Tomoyuki; Kita, Naonori; Matsui, Ryota; Ikeda, Junji

doi:10.1117/12.916594

Cited by 11 publications

(8 citation statements)

References 5 publications

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“…The use of the controllable illumination pupil consisting of numerous point sources may become popular in conventional imaging systems such as microscopes; this approach has already been realized in advanced lithography systems [24][25][26][27][28]. We believe that our basic theory can be utilized to determine the basic specifications for the controllable illumination pupil from the viewpoint of spatial coherence.…”

Section: B Possible Application Of Our Approach For Determining Basimentioning

confidence: 96%

“…Let us assume that the illumination pupil consists of N point sources. In this regard, we remark that, to enhance the imaging properties in advanced micro-photolithography, the complex free-form illumination shape has been utilized recently [24][25][26][27][28]. The illumination pupil can comprise more than 10,000 deg of point sources.…”

Section: Intensity Matrix: Case Of N Point Sourcesmentioning

confidence: 96%

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Analytical solution for Gamo entropy under spatially partial coherent illumination

Yashiki¹

2015

J. Opt. Soc. Am. A

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We present a methodology for obtaining the analytical solution of the Gamo entropy, defined by the intensity matrix proposed by Gamo [J. Opt. Soc. Am.47, 976 (1957)JOSAAH0030-394110.1364/JOSA.47.000976]. The matrix, which consists of numerous image amplitudes at all the sampling points of the entire imaging plane, is generally infinite-dimensional. The essence of our theory is that the computational difficulties arising because of the infinite-dimensionality are avoided by introducing the inner products of two image amplitudes. The integral in continuous space plays the role of a buffer against the infinite-dimensionality. The validity of the approach is confirmed by comparing our analytical solution and Yamazoe's numerical simulations [J. Opt. Soc. Am. A28, 448 (2011)JOAOD60740-323210.1364/JOSAA.28.000448].

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Section: B Possible Application Of Our Approach For Determining Basimentioning

confidence: 96%

Section: Intensity Matrix: Case Of N Point Sourcesmentioning

confidence: 96%

Analytical solution for Gamo entropy under spatially partial coherent illumination

Yashiki¹

2015

J. Opt. Soc. Am. A

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“…The typical controllable parameters for this measurement include the illumination pupils, one-dimensional measurement patterns, and orientations of measurement patterns. To enhance the imaging quality of the latest ArF exposure apparatus, the illumination pupil consists of more than 10,000 deg of freedom, which are known as intelligent illuminator units by the Nikon Corporation [19][20][21][22][23]. Thus, the free-form shape of nonsymmetric illumination is available for this design.…”

Section: Measurement Of Full Wavefront Aberration a Simultaneous Linmentioning

confidence: 98%

Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography

Yashiki¹

2015

Appl. Opt.

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The theory of full wavefront aberration measurements is developed using the intensity differences of aerial images, which are the projected images of one-dimensional measurement patterns consisting of single- or multibars. The key concept is the parity decomposition about the optical axis for two optical components: illumination pupil and wavefront aberration. An additional mathematical treatment, which is a perturbative approach with regard to aberration, is applied to the partially coherent imaging formula. The intensity difference of the two peaks has terms that are linear to the odd and even aberration with rigorously canceled squared aberration terms. The full wavefront aberration measurement is realized from simultaneous linear equations about the intensity difference. The validity of this approach is numerically confirmed under practical lithography conditions.

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“…7 OPE error between numbers of exposure tools could be compensated with optimum pupilgram modulation, the value of which is calculated and applied by OPE-Master, even if an error root cause is unknown. 8 This was enabled by having precise source generation by the intelligent illuminator on NSR. To use a flexibility of the intelligent illuminator, lithographic performance on existing mask could be maximized with SO-Master taken into account the illumination constraints, process window (PW) of depth of focus (DoF) and exposure latitude (EL), and mask enhancement error factor (MEEF) by a global optimization.…”

Section: Introductionmentioning

confidence: 99%

Scanner performance predictor and optimizer in further low-k1 lithography

et al. 2014

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Due to the importance of errors in lithography scanners, masks, and computational lithography in low-k1 lithography, application software is used to simultaneously reduce them. We have developed "Masters" application software, which is all-inclusive term of critical dimension uniformity (CDU), optical proximity effect (OPE), overlay (OVL), lens control (LNS), tool maintenance (MNT) and source optimization for wide process window (SO), for compensation of the issues on imaging and overlay.In this paper, we describe the more accurate and comprehensive solution of OPE-Master, LNS-Master and SO-Master with functions of analysis, prediction and optimization. Since OPE-Master employed a rigorous simulation, a root cause of error in OPE matching was found out. From the analysis, we had developed an additional knob and evaluated a proofof-concept for the improvement. Influence of thermal issues on projection optics is evaluated with a heating prediction, and an optimization with scanner knobs on an optimized source taken into account mask 3D effect for obtaining usable process window. Furthermore, we discuss a possibility of correction for reticle expansion by heating comparing calculation and measurement.

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Application of illumination pupilgram control method with freeform illumination

Cited by 11 publications

References 5 publications

Analytical solution for Gamo entropy under spatially partial coherent illumination

Analytical solution for Gamo entropy under spatially partial coherent illumination

Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography

Scanner performance predictor and optimizer in further low-k1 lithography

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