Due to the importance of errors in lithography scanners, masks, and computational lithography in low-k1 lithography, application software is used to simultaneously reduce them. We have developed "Masters" application software, which is all-inclusive term of critical dimension uniformity (CDU), optical proximity effect (OPE), overlay (OVL), lens control (LNS), tool maintenance (MNT) and source optimization for wide process window (SO), for compensation of the issues on imaging and overlay.In this paper, we describe the more accurate and comprehensive solution of OPE-Master, LNS-Master and SO-Master with functions of analysis, prediction and optimization. Since OPE-Master employed a rigorous simulation, a root cause of error in OPE matching was found out. From the analysis, we had developed an additional knob and evaluated a proofof-concept for the improvement. Influence of thermal issues on projection optics is evaluated with a heating prediction, and an optimization with scanner knobs on an optimized source taken into account mask 3D effect for obtaining usable process window. Furthermore, we discuss a possibility of correction for reticle expansion by heating comparing calculation and measurement.
In order to respond to the constant demand for more productivity in the manufacture of IC devices, higher throughput and higher resolution are fundamental requirements for each new generation of exposure tools. However, meeting both requirements lead to unwanted aberration we refer to as "thermal aberration". In our experience, the problem of the thermal aberrations does not correlated only to the duration of heavy use. It depends very strongly on both the optical settings and the mask patterns, also even on the specific interaction between the two. So, even if using the same illumination settings, there is a possibility to observe different distribution of thermal aberrations. In this paper, we define and investigate various patterns to be used as targets for thermal aberrations compensation. These patterns are identified as the "weak patterns" of the thermal aberration. We assess several cases of thermal aberrations, and show how the optimized compensation for each is determined and then applied on the actual exposure tools.
A high-resolution soft X-ray microscope was constructed using grazing incidence mirrors and a laser-produced plasma source. An Nd-YAG pulse laser (1.064 µm) was focused onto an aluminum target to produce soft X-rays above 4 nm in wavelength. The beam energy of the laser was 1.4 J, with a pulse width of 8 ns. The Wolter type-I mirror was used as an objective mirror and the toroidal mirror as a condenser. The magnification of the objective was 20. A holographic plate was used as a detector. Resolution of about 40 nm was achieved with a single shot.
In order to realize further improvement of productivity of semiconductor manufacturing, higher throughput and better imaging performance are required for the exposure tool. Therefore, aberration control of the projection lens is becoming more and more important not only for cool status performance but also heating status. In this paper, we show the improvements of cool status lens aberration, including scalar wavefront performance and polarization aberration performance. We also discuss various techniques for controlling thermal aberrations including reduction of heat in the lens, simulation, compensating knob, and adjusting method with actual imaging performance data during heating and cooling.
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