Poly(ptrimethylsi1oxystyrene) (1 a), polyb-(tert-butyldimethylsiloxy)styrene] (1 b), poly[p-(tri-methylsi1oxy)-a-methylstyrene] (1 c), poly[p-(tert-butyldimethylsiloxy)-a-methylstyrene) (1 d) and polyfp-[2-(tert-butyldimethylsiloxy)ethyl]styrene] (1 e) were prepared by free-radical or cationic polymerization of the corresponding monomers. Poly([p-[2(trimethylsiloxy)ethyl]styrene]-co-[p-(2-hydroxyethyl)styrene]] (2 a) was synthetized by anionic polymerization of the corresponding trimethylsilylated monomer, followed by acid hydrolysis of the resulting polymer. Polyl[p-[2-(trimethylsiloxy)ethyl]styrene]-co-[p-(tert-butoxycarbonyloxy)styrene]] (2 b) were prepared by freeradical polymerization of the corresponding monomers.
We report a study on the hydrolytic instability of the oxygen‐silicon bond of the following compounds: p‐tert‐butyldimethylsilyloxytoluène, p‐triméthylsilyloxytoluène and poly(p‐triméthylsilyloxystyrène). The instability occurs in an acidic media: HCl, H−2SO4, CF3CO0H, BF3 or in presence of a salt: KPF6, KAsF6, KSbF6, NaBF4, [CH3(CH2)3]4NF, [CH3(CH2)3]4NBF4, [CH3(CH2)3]4NPF6, [CH3(CH2)3]4N AsF6, [CH3(CH2)3]4NSbF6. A mixture containing both an acid and a salt from those previously discussed can also be used.
A number of representative examples is presented. The tert‐butyldimethylsilylether derivatives are much more stable than the trimethylsilylethers. It is shown that the rate of reaction is dependent on the nucleophilicity of anion used in these salts. This simple procedure undoubtedly extends the scope for a preparation of organosilicon resists.
This paper describes a positive resist formulation containing silylated polystyrene polymer, made photosensitive at wavelengths from 220 to 310 nm by means of an onium salt sensitizer ((C6Hg)3SMXn) and at wavelengths from 360 to 450 nm by means of an onium salt and a dye photosensitizer (perylene). In the present study, we report the desilylation
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