Etude Des Reactions De Coupure Des Liaisons O‐Si(CH₃)₃ Dans Des Polystyrenes Silicies En Presence De Sels De Triphenylsulfonium Avec Ou Sans Perylene Sous Irradiation UV Et Visible Et En Couche Mince

Abstract

This paper describes a positive resist formulation containing silylated polystyrene polymer, made photosensitive at wavelengths from 220 to 310 nm by means of an onium salt sensitizer ((C6Hg)3SMXn) and at wavelengths from 360 to 450 nm by means of an onium salt and a dye photosensitizer (perylene). In the present study, we report the desilylation