High resolution electron energy loss spectroscopy study of vapor deposited pyromellitic dianhydride and oxydianiline films on Cu (110) Interfacial reactions between ͑100͒ InP and Pd were investigated as part of a systematic study aimed at investigating the stability of planar nonalloyed metallizations to InP. A 50-nm-thick Pd film was deposited on an InP substrate, and parts of it were subsequently thermally treated for 30 min at temperatures varying from 100 to 500°C in steps of 50°C. Separate characterizations of the Pd, In, and P depth distributions were obtained using mass and energy dispersive recoil spectrometry. The different phases were determined using x-ray diffraction, and scanning electron microscopy was used to study the surface topography. It is assumed that the interaction starts in the as-deposited sample, and definite formation of a ternary phase with the suggested composition Pd 5 In 2 P 2 starts at an annealing temperature of 100°C. At 250°C all Pd is chemically reacted. Preferential outdiffusion of P leads to a loss of P from the surface at 500°C, and the only phase observed in the x-ray diffraction spectrum from the surface is PdIn.
Mass and energy-dispersive recoil spectrometry, where the recoil energy is derived from the recoil time of flight, has been used to characterize the depth distribution of Al, Ga, and As in an AlxGa(1−x)As quantum-well structure. Signals characterizing the Al, Ga, and As distribution with good separation between Ga and As (average crosstalk <2%) could be obtained from depths less than 560 nm from the surface. The depth resolution of the As signal at the surface was 16 nm FWHM, which is considerably better than achieved using a silicon particle detector (34 nm).
Interfacial reactions between (100) InP and thin films of the transition metals Cr, Ni, Pt, and Ti have been studied. A thin layer of metal was deposited onto the InP substrates using e-beam evaporation and parts of the samples were then subjected to heat treatment in vacuum for 30 min at several temperatures up to 500 °C. Separate characterizations of the metal, In, and P depth distributions were carried out using mass and energy dispersive recoil spectrometry. The different crystalline phases observed were determined using x-ray diffraction. The near-noble metals (Ni, Pt) formed ternary phases, while Ti and Cr formed phosphides. The phases formed were generally stable up to 500 °C with the major exception being Pt where the ternary phase decomposed to form PtIn2, PtP2, and Pt3In7.
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