In this work a simple novel method for preparing micro- and nanoscale patterns of polymer chains grafted onto flexible polymer substrates is described. A combination of the two techniques of radiation grafting and "grafting-from" has been made. This combination makes it possible to prepare grafted structures having micro- or nanoscale lateral dimensions that are determined by the electron beam or X-ray irradiation patterns used. The height of the grafted features can be controlled by the irradiation dose or such grafting reaction conditions as time, temperature, or monomer concentration. Our first results for nanopatterned samples demonstrate resolution comparable to those of other polymer-based lithography processes.
Selective exposure of polymer substrates to extreme ultraviolet (EUV) radiation followed by graft polymerization of a second polymer is used to create patterns of polymer brushes. A key feature of this additive structuring process is the possibility to combine the properties of a polymer substrate in precisely predefined regions with the properties of the grafted material. Styrene brushes were grafted onto poly(ethylene-alt-tetrafluoroethylene)( ETFE) substrates after exposure to synchrotron EUV radiation in an interference lithographic setup. The grafted chains are covalently bound to the surface, which allows physical or chemical post-processing without deterioration of the grafted structures.
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