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The polycrystalline thin films were deposited on glass substrate at room temperature by pulsed laser deposition PLD technique. The effects of annealing treatment by used the Oil Thermal Annealing (OTA) process on the structural, optical and electrical properties of ZnO thin film films were investigated. The film structure was investigated by X-ray diffraction to indicate that the heat treatment after the OTA process gives the optimized condition of crystalline. The transmission spectrum of the film was measured by UV-V is spectrophotometer, and the Urbach energy and forbidden band width were calculated. The surface topography of the film was observed by scanning electron microscopy (SEM) image of the ZnO thin film at the OTA process shows the changes in the shape and size of the grains. The atomic force microscopy (AFM) effect of heat treatment was demonstrated by the change in the surface roughness of the ZnO thin film. The electrical properties of thin film were optioned by Hall Effect technique. That these improvements in the ZnO thin film physical properties were annealing temperatures by OTA at 150 °C, 200 °C, 250 °C and 300 °C.

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The photoluminescence spectrums (PL) of as-prepared and rapid thermal annealing RTA of nanostructures silicon have been investigated. p-Type porous silicon (psi) fabricated by electrochemical etching method .The (PL) of as-prepared sample, showed top of photoluminescence (PL) peak centered at about 540.9 nm. After the annealing process of nanostructures silicon in temperature 450°c, 600°c and 750°c at annealing time 15 sec, the (PL) peaks shifted,to 743.99nm, 747.49nm and 757.37 nm rspectively . The intensity of( PL) of annealed samples also shown a conspicuous decrease in intensity Compare with as-prepared sample .The intensity reach to (50%),(39%) and (29%)from its intial value whenthe temperature increase 450, 600°c and 750°c rspectively. This behavour is due to the increase in the average skeleton size.

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