Electronic effects induced by single hydrogen atoms on the Ge(001) surfaceUse of near-surface channel conductance and differential capacitance versus potential measurements to correlate inversion layer formation with low effective surface recombination velocities at n-Si/liquid contacts Appl.A four-point surface conductivity probe suitable for in situ ultrahigh vacuum conductivity measurements Rev.
Realizing an optimal Schottky interface of graphene on Si is challenging, as the electrical transport strongly depends on the graphene quality and the fabrication processes. Such interfaces are of increasing research interest for integration in diverse electronic devices as they are thermally and chemically stable in all environments, unlike standard metal/semiconductor interfaces. We fabricate such interfaces with n-type Si at ambient conditions and find their electrical characteristics to be highly rectifying, with minimal reverse leakage current (<10 −10 A) and rectification of more than 10 6 . We extract Schottky barrier height of 0.69 eV for the exfoliated graphene and 0.83 eV for the CVD graphene devices at room temperature. The temperature dependent electrical characteristics suggest the influence of inhomogeneities at the graphene/n-Si interface. A quantitative analysis of the inhomogeneity in Schottky barrier heights is presented using the potential fluctuation model proposed by Werner and Güttler.
Surface conductance measurements on p-type doped germanium show a small but systematic change to the surface conductivity at different length scales. This effect is independent of the structure of the surface states. We interpret this phenomenon as a manifestation of conductivity changes beneath the surface. This hypothesis is confirmed by an analysis of the classical current flow equation. We derive an integral formula for calculating of the effective surface conductivity as a function of the distance from a point source. Furthermore we derive asymptotic values of the surface conductivity at small and large distances. The actual surface conductivity can only be sampled close to the current source. At large distances, the conductivity measured on the surface corresponds to the bulk value.
To explore the origin of the Fermi level pinning in germanium we investigate the Ge(001) and Ge( 001):H surfaces. The absence of relevant surface states in the case of Ge(001):H should unpin the surface Fermi level. This is not observed. For samples with donors as majority dopants the surface Fermi level appears close to the top of the valence band regardless of the surface structure. Surprisingly, for the passivated surface it is located below the top of the valence band allowing scanning tunneling microscopy imaging within the band gap. We argue that the well known electronic mechanism behind band bending does not apply and a more complicated scenario involving ionic degrees of freedom is therefore necessary. Experimental techniques involve four point probe electric current measurements, scanning tunneling microscopy and spectroscopy.
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