2014
DOI: 10.1016/j.apsusc.2013.09.124
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Atomic scale fabrication of dangling bond structures on hydrogen passivated Si(001) wafers processed and nanopackaged in a clean room environment

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Cited by 40 publications
(48 citation statements)
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“…The dI/dV spectra for both the n-and the p-type Si(100):H surface do not show signature peaks for surface dangling bond or defect states (see Supplementary Data, Section 2 for details), in agreement with previous spectra [6,30], suggesting that such states do not contribute to the contrast inversion. The effect of tip apex to sample distance on the image was explored as well.…”
Section: Resultssupporting
confidence: 86%
“…The dI/dV spectra for both the n-and the p-type Si(100):H surface do not show signature peaks for surface dangling bond or defect states (see Supplementary Data, Section 2 for details), in agreement with previous spectra [6,30], suggesting that such states do not contribute to the contrast inversion. The effect of tip apex to sample distance on the image was explored as well.…”
Section: Resultssupporting
confidence: 86%
“…12 The Si samples were slightly p-doped with resistivity of 10.5 Ωcm corresponding to doping level of 10 15 at/cm 3 . In order to obtain the hydrogen terminated reconstructed surface the 200 nm diameter starting wafers undergo a multistep preparation process including wet chemical cleaning and thermal treatment.…”
mentioning
confidence: 99%
“…10 However, most of these experiments were conducted on a metal surface. [17][18][19][20][21][22][23][24] The application of selective highly doped dehydrogenated nanostructures was also proposed. Therefore, the possibility of providing sufficient electronic decoupling of the molecule from the surface started to be explored and this isolation can be achieved when an ultra-thin insulating layer is covering the metal surface.…”
mentioning
confidence: 99%