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In this paper we show that, despite a high piezoelectric field, a wide InGaN quantum well (QW) can be more effective as the active region of laser diodes (LDs) than the thin ones usually used. The optical gain in the LDs with a single wide QW is studied. It is shown that the differential gain in a LD with 10.4 nm QW is higher than in a LD with three 2.6 nm thick QWs. The high optical gain in a wide QW is interpreted as originating from transitions through excited states. Additionally, a substantial difference in lasing spectra between LDs with wide and thin QWs is found.

We report on III-nitride-based micro-light-emitting diodes (µLEDs) operating at 450 nm wavelength with diameters down to 2 µm. Devices with a standard LED structure followed by a tunnel junction were grown by plasma-assisted molecular beam epitaxy. The emission size of µLEDs was defined by shallow He+ implantation of the tunnel junction region. The ion implantation process allows to create flat devices, applicable to further epitaxial regrowth. The shift of current density for the maximum external quantum efficiency as a function of µLEDs diameter was observed. This effect may be a fingerprint of the change in the external efficiency related to the lateral carrier diffusion (limited by holes) in InGaN quantum wells.

We demonstrate the applications of tunnel junctions (TJs) for new concepts of monolithic nitride-based multicolor light emitting diode (LED) and laser diode (LD) stacks. The presented structures were grown by plasma-assisted molecular beam epitaxy (PAMBE) on GaN bulk crystals. We demonstrate a stack of four LDs operated at pulse mode with emission wavelength of 453 nm. The output power of 1.1 W and high slope efficiency of 2.3 W/A is achieved for devices without dielectric mirrors. Atomically flat surface after the epitaxy of four LD stack and low dislocation density is measured as a result of proper TJ design with optimized doping level. The strain compensation design with InGaN waveguides and AlGaN claddings is shown to be crucial to avoid cracking and lattice relaxation of the 5 µm thick structure. Vertical connection of n-LDs allows for cascade emission of photons and increases the quantum efficiency n-times. The two-color (blue and green) LEDs are demonstrated. Application of TJs simplifies device processing, reducing the need for applications of p-type contact. The key factor enabling demonstration of such devices is hydrogen-free PAMBE technology, in which activation of buried p-type layers is not necessary.

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In this paper we review the recent studies on wide InGaN quantum wells (QWs). InGaN QWs are known to suffer from an extremely high built-in piezoelectric polarization, which separates the electron and hole wavefunctions and causes the quantum-confined Stark effect. It is shown, both by means of modeling and experimentally, that wide InGaN QWs can have quantum efficiency superior to commonly used thin QWs. The high efficiency is explained by initial screening of the piezoelectric field and subsequent emergence of optical transitions involving the excited states of electrons and holes, which have a high oscillator strength. A high pressure spectroscopy and photocurrent measurements are used to verify the mechanism of recombination through excited states. Furthermore, the influence of QW width on the properties of optoelectronic devices is studied. In particular, it is shown how the optical gain forms in laser diodes with wide InGaN QWs.

In this paper, we demonstrate a novel approach utilizing tunnel junction (TJ) to realize GaN-based distributed feedback (DFB) laser diodes (LDs). Thanks to the use of the TJ the top metal contact is moved to the side of the ridge and the DFB grating is placed directly on top of the ridge. The high refractive index contrast between air and GaN, together with the high overlap of optical mode with the grating, provides a high coupling coefficient. The demonstrated DFB LD operates at λ=450.15 nm with a side mode suppression ratio higher than 35dB. The results are compared to a standard Fabry-Perot LD.

Traditionally, Nitride semiconductors have suffered from poor p-type conductivity, requiring Mg activation by removing hydrogen from grown layers either through thermal annealing or electron irradiation. This requirement restricts the growth of buried p-type layers. Here, we report structures obtained using a Hydrogen-free growth technique – plasma assisted molecular beam epitaxy. Using this method, top and bottom tunnel junctions are realized for top and bottom contacts to traditional Ga-polar devices. Advantages of using both constructions are discussed. The efficiency of the bottom-tunnel junction design is presented through realization of a stable laser diode operating at room temperature. Further work needed to improve tunnel junction performance as well as optical mode confinement to fully benefit from this design is outlined.