The optimum conditions for electrodeposition of compact, smooth and adherent Ti films in LiF-LiCl-Li3TiF6 at 823 K were investigated. The Li3TiF6 was formed in situ in the melt via comproportionation reaction between Li2TiF6 and Ti powder. The solubility of Li3TiF6 was confirmed to be higher than 7.1 mol% by cyclic voltammetry and ICP-AES measurement. Galvanostatic electrolysis was conducted on Ni plate substrates at various concentrations of Li3TiF6 (0.55, 2.6, 7.1 mol%) and cathodic current density (50-1200 mA cm −2). Ti films with smoother surface were obtained at higher Li3TiF6 concentration and lower current density. In the present study, the smoothest surface Ti films were obtained at 7.1 mol% of Li3TiF6 and 50 mA cm −2 of cathodic current density.
The effects of temperature, Ti(III) ion concentration, and current density on the electrodeposition of Ti films were investigated in the eutectic LiF–LiCl melt at 823–973 K. The Ti(III) ions were prepared by adding Li2TiF6 and Ti metal to the melt. The diffusion coefficients of Ti(III) were 1.4, 1.8, 2.3, and 3.2 × 10−5 cm2 s−1, at 823, 873, 923, and 973 K, respectively. Galvanostatic electrolysis was conducted at 823–973 K. The surface roughness (S
a) of the Ti films decreases with decreasing temperature. Thus, the electrodeposition of Ti films was conducted at the lowest temperature of 823 K with various Li3TiF6 concentrations (0.55–7.1 mol%) and cathodic current densities (50–1200 mA cm−2). The Sa was lower at higher Ti(III) ion concentrations and lower current densities. The smoothest Ti films with a S
a of 1.23 µm and a thickness of 10 μm were obtained at a cathodic current density of 50 mA cm−2 and Li3TiF6 concentration of 7.1 mol%.
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