Effects of Temperature, Ti(III) Ion Concentration, and Current Density on Electrodeposition of Ti Films in LiF–LiCl Melt

Norikawa, Yutaro; Unoki, Makoto; Yasuda, Kouji

doi:10.1149/1945-7111/ac91fe

Cited by 3 publications

(2 citation statements)

References 34 publications

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“…Furthermore, Ti is naturally abundant; however, its widespread use is hindered by its high smelting costs and poor workability. Therefore, the electrodeposition of Ti has been extensively studied to establish new smelting or plating methods to address these limitations. ,,,− Some of the applications of Ti rely on its superior surface properties, such as corrosion resistance and biocompatibility. If the advantageous surface properties of Ti can be achieved inexpensively, then the range of applications will expand even further.…”

Section: Electrodeposition Of Titaniummentioning

confidence: 99%

A New Concept of Molten Salt Systems for the Electrodeposition of Si, Ti, and W

Norikawa

2023

Acc. Chem. Res.

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Conspectus This Account describes the results of the electrodeposition of film-like Si, Ti, and W by utilizing molten salts selected based on a new concept. The proposed molten salt systems, KF–KCl and CsF–CsCl, have high fluoride ion concentrations, relatively low operating temperatures, and high solubility in water. First, KF–KCl molten salt was used for the electrodeposition of crystalline Si films to establish a new fabrication method for Si solar cell substrates. The electrodeposition of Si films from the molten salt at 923 and 1023 K was successfully achieved using K2SiF6 or SiCl4 as the Si ion source. The crystal grain size of Si was larger at higher temperatures, indicating that higher temperatures are advantageous for the application of Si solar cell substrates. The resulting Si films underwent photoelectrochemical reactions. Second, the electrodeposition of Ti films using the KF–KCl molten salt was investigated to easily impart the properties of Ti, such as high corrosion resistance and biocompatibility, to various substrates. Ti films with a smooth surface were obtained from the molten salt containing Ti(III) ions at 923 K. Electrochemical tests in artificial seawater revealed that the electrodeposited Ti films had no voids and cracks and that the obtained Ti-coated Ni plate had a high corrosion resistance against seawater. Finally, the molten salts were used for the electrodeposition of W films, which are expected to be used as diverter materials for nuclear fusion. Although the electrodeposition of W films was successful in the KF–KCl–WO3 molten salt at 923 K, the surface of the films was rough. Therefore, we used the CsF–CsCl–WO3 molten salt, which can be employed at lower temperatures than KF–KCl–WO3. We then successfully electrodeposited W films with a mirror-like surface at 773 K. Such a mirror-like metal film deposition has not been reported before using high-temperature molten salts. Further, the temperature dependence of the crystal phase of W was revealed by the electrodeposition of W films at 773–923 K. β-W was obtained at 773 and 823 K, α-W was obtained at 923 K, and a mixed phase of α- and β-W was obtained at 873 K. In addition, single-phase β-W films with a thickness of approximately 30 μm were electrodeposited, which has not been reported before. The results show that our proposed molten salt systems are advantageous for electroplating Si, Ti, and W. Our approach is also expected to be applicable for the electrodeposition of other metals such as Zr, Nb, Mo, Hf, and Ta.

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Section: Electrodeposition Of Titaniummentioning

confidence: 99%

A New Concept of Molten Salt Systems for the Electrodeposition of Si, Ti, and W

Norikawa

2023

Acc. Chem. Res.

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“…It is generally believed that in molten salt electrolysis, a large current density contributes to the uniformity of the reaction distribution, but is limited by the diffusion of ions. 20,21 Thus, growth of a uniform and compact carbon film on the metal substrate, particularly at the high coulombic electricity, is always challenged.…”

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Deposition and Morphology Control of Carbon Film through Electrochemical Reduction of Carbonate Ions in Molten LiCl

Zhuang,

Jin,

Xiao

et al. 2023

J. Electrochem. Soc.

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Synthesis of a compact, uniform, and thick carbon film on nickel substrate were conducted by electrochemical reduction of carbonate ions in LiCl-Li2CO3 molten salt. It was found that the carbon consistently forms into a structure of wire and sphere particle. The uniformity and compactness of the carbon film were found to be dependent on the applied current density, electricity, and the electrolysis method. At lower current densities, the carbon tended to grow locally, resulting in larger-sized wires and particles. At higher current density, a relatively uniform and thin carbon film can be synthesized on the beginning but soon changed to a cluster-like structure. The contradiction between current density and carbonate ions` diffusion limit make it is impossible to obtain a compact and uniform film by using constant current electrolysis. By applying pulsed current electrolysis with an average current density of 10 mA cm-2 and a peak current density of 200 mA cm-2, a compact and uniform carbon film with a thickness of approximately 10 μm was successfully prepared.

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Kinetic analysis of the cathodic reduction processes in molten salt electrolysis

Men,

Li,

et al. 2024

Journal of Alloys and Compounds

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Effects of Temperature, Ti(III) Ion Concentration, and Current Density on Electrodeposition of Ti Films in LiF–LiCl Melt

Cited by 3 publications

References 34 publications

A New Concept of Molten Salt Systems for the Electrodeposition of Si, Ti, and W

A New Concept of Molten Salt Systems for the Electrodeposition of Si, Ti, and W

Deposition and Morphology Control of Carbon Film through Electrochemical Reduction of Carbonate Ions in Molten LiCl

Kinetic analysis of the cathodic reduction processes in molten salt electrolysis

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