Optimization of Electrolysis Conditions for Ti Film Electrodeposition from LiF<sub> </sub>– LiCl Eutectic Molten Salt

Unoki, Makoto; Norikawa, Yutaro; Yasuda, Kouji

doi:10.1149/09810.0393ecst

Cited by 2 publications

(2 citation statements)

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“…CsF-CsCl-WO 3 melts.-In our previous study on the electrodeposition of Ti coatings in molten LiF-LiCl-Li 3 TiF 6 , the growth of crystal grains could be effectively suppressed and smoother deposits were obtained by lowering the temperature from 923 to 823 K. 17,18 Thus, in the present study, the temperature was reduced by utilizing CsF-CsCl eutectic melts with the aim to prepare smoother W coatings. Figure 9 shows cyclic voltammograms at a Au flag electrode in molten CsF-CsCl-WO 3 (2.0 mol% WO 3 added) at 823 and 873 K. As observed for the KF-KCl-WO 3 (2.0 mol% added) at 923 K, CsF-CsCl-WO 3 exhibited a cathodic current peak at approximately 1.3 V vs Cs + /Cs at all temperatures, indicating the electrodeposition of W. However, the peak current density at 823 K was too small compared with 873 K. This result suggested that the solubility of WO 3 at 823 K was smaller than 2.0 mol%.…”

Section: Resultsmentioning

confidence: 77%

Electrodeposition of Tungsten from Molten KF–KCl–WO₃ and CsF–CsCl–WO₃

Ide

Meng

Norikawa

et al. 2021

J. Electrochem. Soc.

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The electrodeposition of W films was investigated in KF-KCl eutectic melts after adding 0.5-2.0 mol% of WO6 at 923 K. Cyclic voltammetry at a Ag electrode suggested that the electrodeposition of W from W(VI) ions proceeds from 1.65 V vs. K + /K. Electrodeposition of α-W was confirmed by XRD analysis. The effect of current density and added amount of WO3 on the morphology of W films was investigated by surface and crosssectional SEM, which indicated that the best W film having thickness of ca. 15 μm was obtained at 12.5 mA cm −2 and 2.0 mol% of WO3. Although the film thickness was increased to ca. 30 μm by increasing the charge density, the surface roughness was significantly increased. To suppress the growth of crystal grains, electrodeposition of W was also investigated in CsF-CsCl eutectic melts at lower temperature of 873 K. The XRD confirmed the existences of both α-W and β-W in the W films. The SEM observations revealed that dense and smooth W films having thickness of ca. 30 μm was successfully obtained.

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