Abstract— We have developed a new front projector with a super‐short projection distance of 0.65 m at 100 in. We installed a newly developed reflective‐type projection optical system in this projector, which was composed of only four aspheric mirrors that were free of color aberrations. Using this new system and a single‐chip DMD™, we projected a picture that had excellent sharpness and high contrast from 40 to 100 in. This paper describes the principles, design, and characteristics of the new WT600™ front projector.
In order to achieve high throughput Cu-CMP compatible with low step heights in 32nm Node copper interconnect technologies and beyond, we believe it is crucial a passivation layer on the Cu surface in the slurry during the CMP process. We show that the formation of a passivation layer which achieves good planarization with high Cu removal rate can be controlled by selecting the rest potential of the Cu ions in the slurry.
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