GaMnN dilute magnetic semiconductor samples, prepared by metalorganic chemical vapor deposition, are shown to exhibit ferromagnetism or even paramagnetism depending upon the type and concentration of extrinsic impurity present in the film. In addition, GaMnN deposited using growth parameters normally yielding a nonferromagnetic film becomes strongly ferromagnetic with the addition of magnesium, an acceptor dopant. Based upon these observations, it seems that ferromagnetism in this material system depends on the relative position of the Mn energy band and the Fermi level within the GaMnN band gap. Only when the Fermi level closely coincides with the Mn-energy level is ferromagnetism achieved. By actively engineering the Fermi energy to be within or near the Mn energy band, room temperature ferromagnetism is realized.
We report on the electrical field control of ferromagnetism ͑FM͒ at room temperature in III-N dilute magnetic semiconductor ͑DMS͒ films. A GaMnN layer was grown on top of an n-GaN substrate and found to be almost always paramagnetic. However, when grown on a p-type GaN layer, a strong saturation magnetization ͑M s ͒ was observed. This FM in GaMnN can be controlled by depletion of the holes in the GaMnN/p-GaN/n-GaN multilayer structures. We have demonstrated the dependence of the FM on the thickness of the p-GaN in this heterostructure and on the applied bias to the GaN p-n junction. The M s was measured by an alternating gradient magnetometer ͑AGM͒ and a strong correlation between the hole concentration near the GaMnN/p-GaN interface and the magnetic properties of the DMS was observed. At room temperature an anomalous Hall effect was measured for zero bias and an ordinary Hall effect for reverse bias in a fully depleted p-GaN layer. This is in close agreement with the AGM measurement results.
Dilute magnetic semiconductor films (GaMnN) are highly resistive, making transport measurements difficult to achieve. However, when GaMnN films are sandwiched between p-type doped (AlGaN∕GaN) strained-layer superlattices, holes from the superlattice interact with the Mn3+∕2+ ions and transport measurements were realized. The authors have found also that the ferromagnetic properties of GaMnN critically depend on the level of p-type doping in the superlattice. They report anomalous Hall effect measurements in this (AlGaN∕GaN):Mg∕(GaMnN) multilayered structure. The current results also demonstrate the role of carriers, especially holes, in mediating the ferromagnetic properties of GaMnN dilute magnetic semiconductor films.
We report on the growth and magnetic properties of GaMnN films and p-i-n junctions grown by metalorganic chemical vapor deposition. The magnetic properties of MOCVD grown GaMnN were found to depend upon the type and concentration of the co-dopant. Si or Mg co-doping of GaMnN films led to either ferromagnetic or paramagnetic behavior depending on the concentration. The magnetic properties within the GaMnN material system appear to correlate with the position of the Fermi level. Ferromagnetism was observed only when the Fermi energy level was within or very close to the Mn energy band. The presence of the Fermi energy level within the Mn energy band allows the presence of carriers that mediate ferromagnetism. These results further confirm that the ferromagnetic properties result from a solid solution of Mn in the GaN. Mn-doped GaN p-i-n junctions which were grown to study the effect of the magnetic properties on the I/V characteristics. These devices consist of GaN:Si/GaMnN/GaN:Mg layers grown by metal-organic chemical vapor deposition. The carrier concentrations for the n and p-type layers are ~ 5x10 18 /cm 3 and 1x10 18/cm 3 respectively, where the GaMnN i layer is approximately 0.2-0.45 µm thick with up to 0.5% Mn.
The magnetic properties of GaMnN, grown by metalorganic chemical vapor deposition, depend on the addition of dopants; where undoped materials are ferromagnetic, and n -type (Si-doped) and p -type (Mg-doped) films are either ferromagnetic or paramagnetic depending on dopant concentration. The ferromagnetism of this material system seems correlated to Fermi level position, and is observed only when the Fermi level is within or close to the Mn energy band. This allows ferromagnetism-mediating carriers to be present in the Mn energy band. The current results exclude precipitates or clusters as the origin of room temperature ferromagnetism in GaMnN.
In this study, we report on the diffusion of neodymium (Nd) and erbium (Er) into n-type and undoped GaN and subsequent measurements of the room-temperature (RT) magnetic and optical properties. The diffusion profile has been measured via secondary ion mass spectroscopy (SIMS) with rare-earth (RE) concentration yields of up to 1x10 18 /cm 3 . The ferromagnetic properties were measured using an alternating gradient magnetometer (AGM) giving a saturation magnetization (Ms) of up to 3.17emu/cm 3 for the RE-diffused layer. The photoluminescence (PL) emission of the Nd-diffused and Er-diffused GaN is observable in the near-infrared (NIR) and infrared (IR) regions of the spectrum, respectively. The Nd-diffused GaN samples show NIR emission at 1064nm and 1350nm, while Er-diffused GaN samples have IR emission at 1546nm. This appears to be the first successful result of Nd diffusion doping into GaN crystals, and the first demonstration of above RT ferromagnetism involving GaN diffused with Nd. Details of our ferromagnetic and optical emission studies, related to the RE diffusion into GaN, are presented.
We report on the growth and characterization of dilute magnetic semiconductor GaMnN showing ferromagnetism behavior above room temperature. GaMnN films were grown by MOCVD using (EtCp2)Mn as the precursor for in-situ Mn doping. Structural characterization of the GaMnN films was achieved by XRD, SIMS and TEM measurements. XRD and TEM confirmed that the films were single crystal solid solutions without the presence of secondary phases. SIMS analysis verified that Mn was incorporated homogeneously throughout the GaMnN layer which was ∼0.7μm thick. Ferromagnetic behavior for these films was observed along the c-direction (out of plane orientation) in a Mn concentration range of 0.025–2%. The saturation magnetization ranged from 0.18–1.05 emu/cc for different growth conditions. Curie temperatures of the GaMnN films were determined to be from 270 to above 400K depending on the Mn concentration. This dependence of Curie temperature on concentration of Mn in GaMnN indicates that the grown films are random solid solutions. SQUID measurements ruled out the possibility of spin-glass and superparamagnetism in these MOCVD grown GaMnN films. The grown films were electrically semi-insulating; however PL measurements showed that the films were still optically active after Mn doping. This study showed that the growth of III-Nitride films doped with Mn requires a small window of growth conditions that depend on growth temperature and (EtCp)2Mn flux to achieve ferromagnetism above room temperature, and the magnetic response of the film depends on the Fermi level position. We suggest that ferromagnetism occurs when the Fermi level lies within the Mn energy level which is 1.4 eV above the GaN valence band.
Dilute Magnetic Semiconductors (DMS's) posses a strong potential to make use of the spin of carriers in spintronic devices. Experimental results and theoretical calculations predict that GaN:Mn is a potential semiconductor material for spintronic device applications. The dependence of the room temperature ferromagnetic properties of GaN:Mn/GaN:Mg double heterostructures (DHS) on the Fermi level position in the crystal is demonstrated. Several GaN:Mn/GaN:Mg DHS are grown by metal organic chemical vapor deposition on sapphire. It is shown that initially paramagnetic films can be rendered ferromagnetic by facilitating carrier transfer through the GaN:Mn/GaN:Mg interface. Additionally, it is demonstrated that ferromagnetism depends on the thickness of the GaN:Mn and GaN:Mg layers. The carrier transfer process essentially changes the Fermi level position in the crystal. By choosing the right thicknesses for GaN:Mn and GaN:Mg an optimum DHS that exhibits room temperature ferromagnetism is grown. An identical structure, with the exception of insertion of an AlGaN barrier in order to obstruct the carrier transfer at the interface, results in paramagnetic films for AlGaN barriers thicker than 25nm. These results are explained based on the change in the occupancy of the 3d-Mn impurity band, and indicate that carrier mediation is the possible mechanism for the ferromagnetism observed in the MOCVD grown GaN:Mn material system. This is the first evidence that this material system responds to electronic perturbations, hence ferromagnetism observed is not due to secondary phases or spin glass behavior.
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