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In order to improve hole collection at the interface anode/electron donor in organic photovoltaic cells, it is necessary to insert a hole‐transporting layer. CuI was shown to be a very efficient hole‐transporting layer. However, its tendency to be quite rough tends to induce leakage currents and it is necessary to use a very slow deposition rate for CuI to avoid such negative effect. Herein, we show that the co‐deposition of MoO3 and CuI avoids this difficulty and allows deposition of a homogeneous efficient hole‐collecting layer at an acceptable deposition rate. Via an XPS study, we show that blending MoO3:CuI improves the hole collection efficiency through an increase of the gap state density. This increase is due to the formation of Mo5+ following interaction between MoO3 and CuI. Not only does the co‐evaporation process allow for decreasing significantly the deposition time of the hole‐transporting layer, but also it increases the efficiency of the device based on the planar heterojunction, CuPc/C60.

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ZnO thin films were synthesized on silicon and glass substrates using the plasma-enhanced chemical vapor deposition (PECVD) technique. Three samples were prepared at substrates temperatures of 200, 300, and 400 °C. The surface chemical composition was analyzed by the use of X-Ray Photoelectron spectroscopy (XPS). Structural and morphological properties were studied by using X-ray diffraction (XRD) and scanning electron microscopy (SEM). Optical properties were carried out by UV-visible spectroscopy. XPS spectra showed typical peaks of Zn(2p3/2), Zn(2p1/2), and O(1s) of ZnO with a slight shift attributed to the substrate temperature. XRD analysis revealed hexagonal wurtzite phases with a preferred (002) growth orientation that improved with temperature. Calculation of grain size and dislocation density revealed the crystallization improvement of ZnO when the substrate temperature varied from 200 to 400 °C. SEM images of ZnO films showed textured surfaces composed of grains of spherical shape uniformly distributed. The transmittance yields are reaching 80%, and the values of the band-gap energy indicate that the ZnO films prepared by PECVD present transparent and semiconducting properties.

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