2017
DOI: 10.1016/j.rinp.2017.06.005
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Investigation of some physical properties of ZnO nanofilms synthesized by micro-droplet technique

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Cited by 27 publications
(12 citation statements)
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“…The optical properties (e.g., n and k values) of the ZnO structures depend on the growth or deposition methods. [36][37][38][39][40] Therefore, an accurate measurement of the n and k values of the ZnO film prepared by SPE is essential to facilitate the design of a functional metasurface device. For comparison, the n and k values of both the ZnO seed layer and the ZnO film obtained by SPE were characterized by using a spectroscopic ellipsometer.…”
Section: Optical Properties Of Zno Filmsmentioning
confidence: 99%
“…The optical properties (e.g., n and k values) of the ZnO structures depend on the growth or deposition methods. [36][37][38][39][40] Therefore, an accurate measurement of the n and k values of the ZnO film prepared by SPE is essential to facilitate the design of a functional metasurface device. For comparison, the n and k values of both the ZnO seed layer and the ZnO film obtained by SPE were characterized by using a spectroscopic ellipsometer.…”
Section: Optical Properties Of Zno Filmsmentioning
confidence: 99%
“…The synthesis of colloidal ZnO nanoparticles can be carried out using different types of precursors dissolved in alcohol solvents [26]. We used zinc acetate dehydrate Zn(CH 3 COO) 2 :2H 2 O (99.999%, from Sigma-Aldrich France, St. Louis, MO, USA) as ZnO precursor and methanol as a solvent, following the procedure which is described in more detail in [27].…”
Section: Synthesis Of Zno Nanoparticles Building Unitsmentioning
confidence: 99%
“…The pioneers of zinc oxide synthesis have succeeded in using this material as a window for silicon-based solar cells [16][17][18]. Due to these promising properties, we were interested in the synthesis and growth of ZnO thin nanostructured films, which can increase their electrical properties [19][20][21]. ZnO nanostructured films can be obtained by several methods which can be of physical type such as radio frequency magnetron sputtering [22,23], electron beam evaporation [24,25], pulsed laser deposition [26,27], molecular beam epitaxy (MBE) [28,29], or of chemical type as spin coating [30,31], dip coating [32,33], spray pyrolysis [34,35], chemical vapor deposition (CVD) [36,37] and plasma-enhanced chemical vapor deposition (PECVD) [38,39].…”
Section: Introductionmentioning
confidence: 99%