Overcoming the difficulty in the precise definition of the metal phase of metal−Si heterostructures is among the key prerequisites to enable reproducible next-generation nanoelectronic, optoelectronic, and quantum devices. Here, we report on the formation of monolithic Al−Si heterostructures obtained from both bottom-up and top-down fabricated Si nanostructures and Al contacts. This is enabled by a thermally induced Al−Si exchange reaction, which forms abrupt and void-free metal−semiconductor interfaces in contrast to their bulk counterparts. The selective and controllable transformation of Si NWs into Al provides a nanodevice fabrication platform with high-quality monolithic and single-crystalline Al contacts, revealing resistivities as low as ρ = (6.31 ± 1.17) × 10 −8 Ω m and breakdown current densities of J max = (1 ± 0.13) × 10 12 Ω m −2 . Combining transmission electron microscopy and energy-dispersive X-ray spectroscopy confirmed the composition as well as the crystalline nature of the presented Al−Si−Al heterostructures, with no intermetallic phases formed during the exchange process in contrast to state-of-the-art metal silicides. The thereof formed single-element Al contacts explain the robustness and reproducibility of the junctions. Detailed and systematic electrical characterizations carried out on back-and top-gated heterostructure devices revealed symmetric effective Schottky barriers for electrons and holes. Most importantly, fulfilling compatibility with modern complementary metal−oxide semiconductor fabrication, the proposed thermally induced Al−Si exchange reaction may give rise to the development of nextgeneration reconfigurable electronics relying on reproducible nanojunctions.

and drain electrodes in highly scaled p-channel field-effect transistors (FETs) for the realization of very-large-scale integration (VLSI) systems. [1] Despite these efforts, the continuous scaling of metaloxide-semiconductor field-effect transistors (MOSFETs) is approaching physical limits where the nature of deterministic charge carrier separation between source and drain by an energy barrier is not applicable anymore. [2,3] In the quest of overcoming scaling limitations, new lines of research arose. Device research has shifted toward new architectures, materials, and technologies to enable "More than Moore" paradigms, [4] extending the mature Si complementary metal-oxidesemiconductor (CMOS) platform. [5] In this regard, Si 1−x Ge x and Ge active regions integrated on Si platforms are promising candidates for future optoelectronic devices [6] and the realization of energy efficient steep subthreshold switches such as band-to-band tunneling transistors (TFETs), [7,8] negative capacitance Ge nanowire FETs, [9,10] and positive feedback FETs. [11] Conventionally, degenerately doped semiconductor regions in combination with thin layers made of transition-metal semiconductor alloys, such as metalsilicides [12] and metal-germanides, [13] have been used to obtain ohmic contacts to most Si 1−x Ge x and Ge based devices. Toward the achievement of ohmic contacts, pinning-free metal semiconductor contacts have been explored in Si and Ge through Si 1−x Ge x is a key material in modern complementary metal-oxide-semiconductor and bipolar devices. However, despite considerable efforts in metal-silicide and -germanide compound material systems, reliability concerns have so far hindered the implementation of metal-Si 1−x Ge x junctions that are vital for diverse emerging "More than Moore" and quantum computing paradigms. In this respect, the systematic structural and electronic properties of Al-Si 1−x Ge x heterostructures, obtained from a thermally induced exchange between ultrathin Si 1−x Ge x nanosheets and Al layers are reported. Remarkably, no intermetallic phases are found after the exchange process. Instead, abrupt, flat, and void-free junctions of high structural quality can be obtained. Interestingly, ultra-thin interfacial Si layers are formed between the metal and Si 1−x Ge x segments, explaining the morphologic stability. Integrated into omega-gated Schottky barrier transistors with the channel length being defined by the selective transformation of Si 1−x Ge x into single-elementary Al leads, a detailed analysis of the transport is conducted. In this respect, a report on a highly versatile platform with Si 1−x Ge x composition-dependent properties ranging from highly transparent contacts to distinct Schottky barriers is provided. Most notably, the presented abrupt, robust, and reliable metal-Si 1−x Ge x junctions can open up new device implementations for different types of emerging nanoelectronic, optoelectronic, and quantum devices.

Low-dimensional Ge is perceived as a promising building block for emerging optoelectronic devices. Here, we present a wafer-scale platform technology enabling monolithic Al-Ge-Al nanostructures fabricated by a thermally induced Al-Ge exchange reaction. Transmission electron microscopy confirmed the purity and crystallinity of the formed Al segments with an abrupt interface to the remaining Ge segment. In good agreement with the theoretical value of bulk Al-Ge Schottky junctions, a barrier height of 200 ± 20 meV was determined. Photoluminescence and μ-Raman measurements proved the optical quality of the Ge channel embedded in the monolithic Al-Ge-Al heterostructure. Together with the wafer-scale accessibility, the proposed fabrication scheme may give rise to the development of key components of a broad spectrum of emerging Ge-based devices requiring monolithic metal-semiconductor–metal heterostructures with high-quality interfaces.

Modern society is highly depending and relying on electronic computing devices, as for example, employed in efficient servers, personal computers, and mobiles, and currently being explored toward the realization of emerging computing paradigms, such as "artificial intelligence" and the "Internet of Things". [1] A key enabler for these paradigms is the complementary metal-oxide-semiconductor (CMOS) technology, which utilizes the concept of complementary n-and p-type field-effect transistors (FET) to construct Boolean logic gates. Importantly, in CMOS technology the logic functions are fixed by the physical layout of interconnects and the definition of doped regions and thus do not allow for a flexible alteration of the circuits after production. The continuous shrinking of feature sizes of these Si metal-oxide-semiconductor field-effect transistors (MOSFETs) has been providing performance enhancement and higher power efficiency throughout the last decades. However, classical scalability is limited [2] and the static nature of the MOSFET primitives was not developed to provide runtimeadaptability as required for new circuit paradigms. A concept to overcome the static nature in CMOS technology and reduce overall circuit area and power consumption are reconfigurable FETs (RFETs), [3][4][5] encompassing a broad family of devices that enable a reconfiguration of the dominant carrier type based on either Schottky-barrier field-effect transistors (SBFET), [4,[6][7][8][9] or steep slope band-to-band tunneling transistors (TFET), [10][11][12][13] capable of dynamically altering the device operation between n-and p-type. This device concept thus gives rise to a paradigm change where devices, circuits, and even systems are actively and dynamically reconfigured after manufacturing or, as particularly noteworthy, even during run-time, enabling an adaption to the needed logic function of a circuit. Importantly, this "fine-grain" approach is fundamentally different to the already available "coarse-grain" approach followed in field programmable gate arrays (FPGAs) [14] based on signal routing to predefined logic blocks, resulting in high latency in data Metal-semiconductor heterostructures providing geometrically reproducible and abrupt Schottky nanojunctions are highly anticipated for the realization of emerging electronic technologies. This specifically holds for reconfigurable field-effect transistors, capable of dynamically altering the operation mode between n-or p-type even during run-time. Targeting the enhancement of fabrication reproducibility and electrical balancing between operation modes, here a nanoscale Al-Si-Al nanowire heterostructure with single elementary, monocrystalline Al leads and sharp Schottky junctions is implemented. Utilizing a three top-gate architecture, reconfiguration on transistor level is enabled. Having devised symmetric on-currents as well as threshold voltages for n-and p-type operation as a necessary requirement to exploit complementary reconfigurable circuits, selected implementations of log...

The ability to stack nanosheet transistors is an important prerequisite for the realization of vertically monolithic 3D integrated circuits enabling higher integration densities of functions and novel circuit topologies that relax miniaturization constraints. In this respect, a wafer‐scale platform is presented embedding high‐quality nanoscale polycrystalline Ge channels into monolithic metal‐semiconductor heterostructures. Thereto, a fabrication scheme comprising a combination of flash lamp annealing, crystallizing ultra‐thin amorphous Ge nanosheets, and a thermally induced Al‐Ge exchange reaction is demonstrated, facilitating the formation of self‐aligned Al leads enabling sharp Al‐Ge heterojunctions. The high quality of the obtained polycrystalline Al‐Ge‐Al heterostructure nanosheets is confirmed by µ‐Raman, scanning transmission electron microscopy, energy‐dispersive X‐ray spectroscopy, and electron backscatter diffraction measurements. Embedded in back‐ and top‐gate field‐effect transistor architectures, the electrical transport in polycrystalline Al‐Ge‐Al heterostructures is systematically analyzed. Enabling a complementary metal‐oxide‐semiconductor compatible wafer‐scale accessibility of high‐quality polycrystalline Ge with self‐aligned Al contacts, the proposed platform significantly contributes to the development of a broad spectrum of emerging 3D integrated Ge nanodevices.

Reconfigurable field‐effect transistors, capable of being dynamically programmed during run‐time, overcome the static nature of conventional complementary metal‐oxide semiconductors by reducing the transistor count and the circuit path delay. Thereby, SiGe and Ge are predicted to boost drive currents, switching speed and to reduce power consumption. Nevertheless, Ge‐based reconfigurable field‐effect transistor prototypes have so far fallen short in reaching both the promised performance due to interface instability to their contacts and gate oxides, as well as in reaching the current–voltage symmetry necessary for circuit applicability. Here, a top‐down fabricated SiGe‐based reconfigurable transistor technology is reported that is comprised of a vertical Si‐Si0.67Ge0.33 heterostructure enabling the envisioned high and symmetric on‐currents of both n‐ and p‐type operation. Monolithic integration with single‐elementary crystalline Al contacts alleviates process variability compared to conventional Ni‐silicide/Ni‐germanide contacts and introduces an ultra‐thin Si interlayer providing stability and equal injection efficiency of holes and electrons. The implementation of a three top‐gate transistor in combination with a hysteresis‐free Si/SiO2/HfO2 gate stack enhances polarity control and leakage current suppression to limit static power dissipation. Importantly, the obtained Al‐Si‐SiGe multi‐heterojunction and advanced reconfigurable transistor design is the first Ge‐based technology showing the envisioned stability and performance enhancements.

To establish high-bandwidth chip-to-chip interconnects in optoelectronic integrated circuits, requires high-performance photon emitters and signal receiving components. Regarding the photodetector, fast device concepts like Schottky junction devices, large carrier mobility materials and shrinking the channel length will enable higher operation speed. However, integrating photodetectors in highly scaled ICs technologies is challenging due to the efficiencyspeed trade-off. Here, we report a scalable and CMOS-compatible approach for an ultra-scaled germanium (Ge) based photodetector with tunable polarity. The photodetector is composed of a Ge Schottky barrier field effect transistor with monolithic aluminum (Al) source/drain contacts, offering plasmon assisted and polarization-resolved photodetection. The ultra-scaled Ge photodetector with a channel length of only 200 nm shows high responsivity of about R=424 A W −1 and a maximum polarization sensitivity ratio of TM/TE = 11.

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