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Ag-doped ZnO films were prepared by direct current reactive magnetron sputtering using a zinc target with various Ag-chips attached. The influence of Ag doping on the microstructure, photoluminescence and Raman scattering of ZnO films were systematically investigated. The results indicate that ZnO films doped with Ag can still retain a wurtzite structure, although the c-axis as preferred orientation is decreased by Ag doping. The near band edge emission of ZnO film can be enhanced by Ag doping with a concentration of 1.6–2.8 at.% and quench with a further increase in the Ag concentration. A local vibrational mode at 411 cm−1 induced by Ag dopant can be observed in the Raman spectra of the Ag-doped ZnO films, which might be used as an indication of Ag incorporation into the ZnO lattice.

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We demonstrate an electrolyte-based voltage tunable vanadium dioxide (VO2) memory metasurface. Large spatial scale, low voltage, non-volatile switching of terahertz (THz) metasurface resonances is achieved through voltage application using an ionic gel to drive the insulator-to-metal transition in an underlying VO2 layer. Positive and negative voltage application can selectively tune the metasurface resonance into the “off” or “on” state by pushing the VO2 into a more conductive or insulating regime respectively. Compared to graphene based control devices, the relatively long saturation time of resonance modification in VO2 based devices suggests that this voltage-induced switching originates primarily from electrochemical effects related to oxygen migration across the electrolyte–VO2 interface.

The local Fe structure and corresponding ferromagnetism are different for various concentrations of Fe-doped ZnO (Zn 1−x Fe x O, x = 0-0.07) films, which are prepared on LiNbO 3 (104) substrates by reactive magnetron sputtering. X-ray photoelectron spectroscopy and x-ray absorption near-edge structure (XANES) reveal that, when x 0.04, Fe is in the 2+ state and is incorporated into the wurtzite lattice of ZnO, and as x increases further, a second phase Fe 3 O 4 is induced. Furthermore, full multiple-scattering substitution ab initio calculation of Fe K -edge XANES is used to confirm the local structure of Fe in films with different x. The single-phase Fe-doped ZnO films (x 0.04) exhibit ferromagnetism above room temperature and the mechanism of bound magnetic polarons (BMPs) is proposed to discuss the magnetic properties. The presence of the second phase is responsible for the strong ferromagnetism for higher Fe concentration.

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Three different insulator layers SiNx, SiON, and SiO2 were used as a gate dielectric and passivation layer in AlGaN/GaN metal–insulator–semiconductor high-electron-mobility transistors (MIS-HEMT). The SiNx, SiON, and SiO2 were deposited by a plasma-enhanced chemical vapor deposition (PECVD) system. Great differences in the gate leakage current, breakdown voltage, interface traps, and current collapse were observed. The SiON MIS-HEMT exhibited the highest breakdown voltage and Ion/Ioff ratio. The SiNx MIS-HEMT performed well in current collapse but exhibited the highest gate leakage current density. The SiO2 MIS-HEMT possessed the lowest gate leakage current density but suffered from the early breakdown of the metal–insulator–semiconductor (MIS) diode. As for interface traps, the SiNx MIS-HEMT has the largest shallow trap density and the lowest deep trap density. The SiO2 MIS-HEMT has the largest deep trap density. The factors causing current collapse were confirmed by Photoluminescence (PL) spectra. Based on the direct current (DC) characteristics, SiNx and SiON both have advantages and disadvantages.