We fabricated a two-dimensional subwavelength structured (SWS) surface upon a crystal silicon substrate. The SWS surface was patterned by electron beam lithography and etched by an SF(6) fast atom beam. The SWS grating had a conical profile, the period was 150 nm, and the groove was approximately 350 nm deep. The reflectivity was examined at 2002500-nm wavelengths. At 400 nm the reflectivity decreased to 0.5% from the 54.7% of the silicon substrate. We also used HeNe laser light to examine the reflectivity as a function of the incident angle.

Cantilevers fabricated by means of micromachining techniques are usually used for atomic force microscopy. In this paper, the spring constant of an atomic force microscope (AFM) cantilever is determined by using a large-scale cantilever. Since the spring constant of the large-scale cantilever is calibrated accurately, the spring constant of the AFM cantilever is determined precisely by measuring the deflections of both cantilevers simultaneously using heterodyne interferometry. The slope of the force curve gives the spring constant of the AFM cantilever. It is not necessary to measure the dimensions of the AFM cantilever in the proposed method. Although this method is simple, the spring constant of the AFM cantilever is obtained accurately.

An ordered anodic porous alumina membrane has been used as a lithographic mask of SF6 fast atom beam etching to generate a 100 nm period antireflection structure on a silicon substrate. The antireflection structure consists of a deep hexagonal grating with 100 nm period and aspect ratio of 12, which is a fine two-dimensional antireflection structure. In the wavelength region from 400 to 800 nm, the reflectivity of the silicon surface decreases from around 40% to less than 1.6%. The measured results are explained well with the theoretical results calculated on the basis of rigorous coupled-wave analysis.

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A Schottky ultraviolet photodiode using a (0001) ZnO single crystal grown by the hydrothermal growth method is reported. The photodiode consisted of a semitransparent Pt film for the Schottky electrode and an Al thin film for the Ohmic electrode. The photodiode had polarity dependences on current-voltage characteristics and on responsivity. In the case of the Schottky electrode on the zinc surface, the responsivity was 0.185A∕W at a wavelength of 365nm. On the other hand, the responsivity was 0.09A∕W for an oxygen surface. The results are attributed to the polarity dependences of surface chemical reactivity and the surface state density on ZnO surfaces.

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