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Ammonothermal GaN samples with the concentration of free electrons of 1018 and 1019 cm−3 were annealed in a wide range of temperatures (Tann = 300–1400 °C) under atmospheric N2 pressure and under ultra-high N2 pressure conditions to avoid the GaN decomposition. Photoluminescence (PL) studies reveal the YL2 band with a maximum at 2.3 eV before annealing and two new PL bands after annealing at Tann > 600 °C: the OL3 band with a maximum at 2.1 eV and the RL4 band with a maximum at 1.6–1.7 eV. The ammonothermal GaN samples have high concentrations of complexes containing gallium vacancy (VGa), hydrogen, and oxygen. The first-principles calculations suggest that the VGa-3Hi complex is the origin of the YL2 band, while the VGa-3ON complex is responsible for the RL4 band.

Recent results of GaN bulk growth performed in Poland are presented. Two technologies are described in detail: halide vapor phase epitaxy and basic ammonothermal. The processes and their results (crystals and substrates) are demonstrated. Some information about wafering procedures, thus, the way from as-grown crystal to an epi-ready wafer, are shown. Results of other groups in the world are briefly presented as the background for our work.

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X-ray topography defect analysis of entire 1.8-inch GaN substrates, using the Borrmann effect, is presented in this paper. The GaN wafers were grown by the ammonothermal method. Borrmann effect topography of anomalous transmission could be applied due to the low defect density of the substrates. It was possible to trace the process and growth history of the GaN crystals in detail from their defect pattern imaged. Microscopic defects such as threading dislocations, but also macroscopic defects, for example dislocation clusters due to preparation insufficiency, traces of facet formation, growth bands, dislocation walls and dislocation bundles, were detected. Influences of seed crystal preparation and process parameters of crystal growth on the formation of the defects are discussed.

Photoluminescence (PL) from GaN substrates fabricated by the ammonothermal growth method was studied in a wide range of temperatures and excitation intensities, both with steady-state and time-resolved PL techniques. Three defect-related PL bands were detected: the ultraviolet luminescence band with the zero-phonon line at 3.27 eV, the Zn-related BL1 band with a maximum at 2.9 eV, and the yellow luminescence band (labeled YL2) with a maximum at 2.3 eV. The YL2 band belongs to an unknown defect and is different from the CN-related YL1 band. Its maximum blueshifts by 0.06 eV with increasing excitation intensity and redshifts by more than 0.1 eV with a time delay after a laser pulse. The YL2 band is preliminarily attributed to a defect complex containing the gallium vacancy.

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