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A two-band model involving the heavy- and light-hole bands was adopted to analyze the temperature-dependent Hall effect measured on Mg-doped p-type GaN epilayers. At 300 K, the hole concentration was determined to be nearly twice the Hall concentration estimated from the measured Hall coefficient, meanwhile the Hall mobility of heavy hole turned out to be only half of the measured one. It is shown that the scattering by space charge and acoustic deformation potential is anomalously enhanced in Mg-doped GaN, and that the light hole affects conspicuously the observed transport parameters.

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Articles you may be interested inInGaN metal-semiconductor-metal photodetectors with triethylgallium precursor and unactivated Mg-doped GaN cap layers

The material qualities of GaN overlayers grown on (0001) sapphire substrates by metal-organic chemical vapour deposition were investigated as a function of nitridation time. The nitridation of sapphire surface notably affects on the properties of the GaN overlayers, such as surface morphology and structural, optical and electrical properties. The GaN overlayer with a short nitridation time of 30 s shows a good surface morphology, a relatively low background Hall carrier concentration and a high electron mobility, but the defect-related emission around 550 nm increased. Furthermore, for the GaN overlayer with nitridation for 180 s, even though it has a low (102) full width at half-maximum of the high-resolution x-ray diffraction rocking curve, other material properties were degraded owing to the long nitridation time. It was found that material properties have a trade-off relationship with the variation of nitridation time.