We report record high electron mobility in modulation-doped Si/SiGe. Samples grown by ultrahigh vacuum chemical vapor deposition (UHV-CVD) with mobility values in the range of 3.2–5.2×105 cm2/V s have been measured at 0.4 K. The current and temperature dependence of the magnetoresistance in those samples have been examined and the scattering times are deduced from these measurements. At high magnetic field (≳10 T), fractional quantum Hall filling factors have been observed, and the corresponding activation energies have been calculated. These are significantly larger than previously reported values in Si/SiGe, and are comparable to those in GaAs/AlGaAs modulation-doped heterostructures with mobility higher than 1×106 cm2/V s.

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Articles you may be interested inTemperature dependence of electron and hole mobilities in heavily impurity-doped SiGe single crystals J. Appl. Phys. 98, 063702 (2005); Calculation of hole mobility in doped SiGe alloys using a Monte Carlo method with a bond orbital band structure

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We report electron transport properties of modulation-doped Si/SiGe at 300 and 77 K. Record mobilities of 2830 and 18 000 cm2/V s at 300 and 77 K, respectively, have been measured. Depending on the spacer layer thickness, the sheet resistance of the Si channel is in the range of 2000–10 000 Ω/⧠ at 300 K and 450–700 Ω/⧠ at 77 K. The low field electron drift velocity is 2–3 (5–10) times higher than the corresponding velocity measured in Si/SiO2 structures at 300 K (77 K). The saturation velocity is measured to be only 5% higher than in bulk Si, at both 300 and 77 K, but appears at a lower electric field. The effect of the enhanced transport properties in modulation-doped Si/SiGe on device design and performance is investigated.