The thermal decomposition of Ti 3 SiC 2 in vacuum furnace up to 1500°C has been investigated. The results show that the mild decomposition of Ti 3 SiC 2 commences at 1300°C and the higher the holding temperature, the larger the volatilization of Si atoms. The Ti 3 SiC 2 decomposition occurs simultaneously on the surface and in the bulk. Four phases coexist at 1400°C and 1450°C and the Ti 5 Si 3 C x phase appears in the bulk and/or surface. Diffusion distance, rate, and volatilization of Si contribute to the porous structure and the presence of Ti 5 Si 3 C x . The evolution of furnace pressure reflects the decomposition kinetics of Ti 3 SiC 2 .
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