High conversion efficiencies were achieved in low cost n–p heterojunction oxide solar cells with an Al-doped ZnO (AZO)/non-doped ZnO (ZO)/Cu2O structure. This achievement was made possible by the formation of an n-ZO thin-film layer, prepared with an appropriate thickness by low damage deposition, on high quality Cu2O sheets produced by the thermal oxidization of copper sheets: n-ZO thin film optimal thickness ranges from 30 to 50 nm. Photovoltaic characteristics such as an open circuit voltage of 0.69 V, a fill factor of 0.55 and a conversion efficiency of 3.83% were attained under simulated AM1.5G solar illumination.
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Five hundred-nanometer-thick ZnO-based textured polycrystalline films consisting of 490-nm-thick Al-doped ZnO (AZO) films deposited on 10-nm-thick Ga-doped ZnO (GZO) films exhibited a high Hall mobility (μH) of 50.1 cm2/Vs with a carrier concentration (N) of 2.55 × 1020 cm−3. Firstly, the GZO films were prepared on glass substrates by ion plating with dc arc discharge, and the AZO films were then deposited on the GZO films by direct current magnetron sputtering (DC-MS). The GZO interface layers with a preferential c-axis orientation play a critical role in producing AZO films with texture development of a well-defined (0001) orientation, whereas 500-nm-thick AZO films deposited by only DC-MS showed a mixture of the c-plane and the other plane orientation, to exhibit a μH of 38.7 cm2/Vs with an N of 2.22 × 1020 cm−3.
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