This paper presents methods used to improve reflective dielectric film color pictures. These changes include improvements in color purity, increased brightness, and elimination of any light absorption within the film layers. The color picture is fabricated by varying the silicon dioxide film thicknesses across a silicon wafer and coating the entire wafer with a thin layer of silicon nitride. In addition to the demonstration of fabricated color pictures, we also present more detailed calculation of basis colors and provide details of the fabrication process.
Wavelength selective coupling is demonstrated between the core of a D-shaped optical fiber and a multimode planar waveguide. The fabrication process consists of wet chemical etching of the D-fiber and spin coating or molding to produce the planar waveguide. This fabrication process is shown to produce weak coupling and long interaction length, which exhibits transmission dips with narrow wavelength linewidths. A comb filter is demonstrated with peak separations of 12nm, transmission dips of -20dB, and linewidths of 0.25nm. High sensitivity is demonstrated by showing shift in the transmission dips of -3.16 nm/degree C.
We demonstrate the operation of an in-fiber electric field sensor. The sensor is fabricated with selective chemical etching of the core of a D-shaped optical fiber followed by the deposition of an electro-optic polymer (PMMA/DR1), which forms a hybrid core. The device demonstrates electromagnetic field sensitivity less than 100 V/m at a frequency of 2.9 GHz. Epi is estimated to be 60 MV/m with an insertion loss of 14.4 dB.
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