We present n‐type bifacial solar cells with a rear interfacial SiOx/n+:poly‐Si passivating contact (‘monoPoly’ cells) where the interfacial oxide and n+:poly‐Si layers are fabricated using an industrial inline plasma‐enhanced chemical vapor deposition (PECVD) tool. We demonstrate outstanding passivation quality with dark saturation current density (J0) values of approximately 3 fA/cm2 and implied open‐circuit voltage (iVoc) of 730 mV at 1‐sun conditions after firing in an industrial belt furnace. Using a simple solar cell process flow that can be easily adapted for mass production, a peak cell efficiency of 22.8% with a cell open circuit voltage (Voc) of 696 mV is achieved on large‐area, screen‐printed, Czochralski‐silicon (Cz‐Si) solar cells using commercial fire‐through metal pastes.

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A conductive nanocomposite containing nickel nanostrands TM in carbon fiber-reinforced polymeric composite (M55 carbon fibers in toughened polycyanate resin matrix, RS-3) was investigated for electromagnetic interference (EMI) and electrostatic discharge (ESD) shielding effectiveness when subjected to the tension-tension fatigue load. These were measured in terms of dB attenuation and sheet resistance, respectively. Four configurations, one without nickel nanostrands and other three with different locations of nickel nanostrands layers, were investigated. The locations were outside surfaces, dispersed throughout the laminate thickness or the midplane. Fatigue strength was not affected by the addition of nickel nanostrands at any location. The addition of nickel nanostrands enhanced, in general, the EMI and ESD shielding effectiveness of the baseline polymeric composite with carbon fibers. However, the exterior location provided the maximum enhancement of EMI and ESD effectiveness.