Plasmonic colour printing has drawn wide attention as a promising candidate for the next-generation colour-printing technology. However, an efficient approach to realize full colour and scalable fabrication is still lacking, which prevents plasmonic colour printing from practical applications. Here we present a scalable and full-colour plasmonic printing approach by combining conjugate twin-phase modulation with a plasmonic broadband absorber. More importantly, our approach also demonstrates controllable chromotropic capability, that is, the ability of reversible colour transformations. This chromotropic capability affords enormous potentials in building functionalized prints for anticounterfeiting, special label, and high-density data encryption storage. With such excellent performances in functional colour applications, this colour-printing approach could pave the way for plasmonic colour printing in real-world commercial utilization.

The progress of metaoptics relies on identifying photonic materials and geometries, the combination of which represents a promising approach to complex and desired optical functionalities. Material candidate options are primarily limited by natural availability. Thus, the search for meta-atom geometries, by either forward or inverse means, plays a pivotal role in achieving more sophisticated phenomena. Past efforts mainly focused on building the geometric library of individual meta-atoms and synthesizing various ones into a design. However, those efforts neglected the powerfulness of perturbative metaoptics due to the perception that perturbations are usually regarded as adverse and in need of being suppressed. Here, we report a perturbation-induced countersurveillance strategy using compound nanosieves mediated by structural and thermal perturbations. Private information can be almost perfectly concealed and camouflaged by the induced thermal-spectral drifts, enabling information storage and exchange in a covert way. This perturbative metaoptics can self-indicate whether the hidden information has been attacked during delivery. Our results establish a perturbative paradigm of securing a safer world of information and internet of things.

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Wearable plasmonic devices combine the advantages of high flexibility, ultrathinness, light weight, and excellent integration with the optical benefits mediated by plasmon-enhanced electric fields. However, two obstacles severely hinder further developments and applications of a wearable plasmonic device. One is the lack of efficient approach to obtaining devices with robust antimotion-interference property, i.e., the devices can work independently on the morphology changes of their working structures caused by arbitrary wearing conditions. The other issue is to seek a facile and high-throughput fabrication method to satisfy the financial requirement of industrialization. In order to overcome these two challenges, a functional flexible film of nanowire cluster is developed, which can be easily fabricated by taking the advantages of both conventional electrochemical and sputtering methods. Such flexible plasmonic films can be made into wearable devices that work independently on shape changes induced by various wearing conditions (such as bending, twisting and stretching). Furthermore, due to plasmonic advantages of color controlling and high sensitivity to environment changes, the flexible film of nanowire cluster can be used to fabricate wearable items (such as bracelet, clothes, bag, or even commercial markers), with the ability of wireless visualization for humidity sensing.

Strongly coupled plasmonic nanostructures with sub-10 nm gaps can enable intense electric field enhancements which greatly benefit the various light-matter interactions. From the point view of practical applications, such nanostructures should be of low-cost, facile fabrication and processing, large-scale with high-yield of the ultrasmall gaps, and easy for integration with other functional components. However, nowadays techniques for reliable fabrication of these nanostructures usually involve complex, time-consuming, and expensive lithography procedures, which are limited either by their low-throughput or the small areas obtained. On the other hand, so far most of the studies on the sub-10 nm gap nanostructures mainly focused on the surface-enhanced Raman scattering and high-harmonic generations, while leaving other nonlinear optical properties unexplored. In this work, using a scalable process without any lithography procedures, we demonstrated a centimeter-scale ordered plasmonic nanorod array film (PNRAF) with well-defined sub-10 nm interparticle gaps as a versatile platform for strongly enhanced light-matter interactions. Specifically, we showed that due to its plasmon-induced localized electromagnetic field enhancements, the Au PNRAF could exhibit extraordinary intrinsic multi-photon avalanche luminescence (MAPL) and nonlinear saturable absorption (SA). Furthermore, the PNRAF can be easily integrated with semiconductor quantum dots (SQDs) as well as wide bandgap semiconductors to strongly enhance their fluorescence and photocurrent response, respectively. Our method can be easily generalized to nanorod array films consisting of other plasmonic metals and even semiconductor materials, which can have multiple functionalities derived from different materials. Overall, the findings in our study have offered a potential strategy for design and fabrication of nanostructures with ultrasmall gaps for future photonic and optoelectronic applications.