A process for reproducibly and reliably realizing thin-layer patterning having details with dimensions of 100 nm or even less is described. This process has been called mold lithography. It is a two-step process: First, a photopolymerization-replication step is carried out, after which pattern transfer is realized through, e.g., wet or dry etching into the substrate material. We performed a number of elementary experiments to evaluate this process. Processing conditions are given and the obtained results are discussed. The strengths of this process are its simplicity and low cost while maintaining compatibility with (standard) semiconductor-technology processing.
The aim of this paper is to review almost a decade of direct-bonding activities at Philips Research including the diversity and feasibility of direct bonding. The bondability of a material is determined by its geometrical shape and mechanical, physical, and chemical surface states. Physically direct bonding provides a vacuumtight bond, which is jointless and glueless, and it permits engineering of the interfaces to be bonded. Layers can be buried, and reflective-lossless bonds between optical elements can be created. A variety of materials are investigated: (refractory) metals, a semimetal, boron, diamond, a carbide, fluorides, nitrides, oxides, and a chalcogenide. The applications that we describe relate to interface engineering, waveguiding, and the direct bonding of a fiber plate.
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