Mold-assisted nanolithography: A process for reliable pattern replication

Abstract

A process for reproducibly and reliably realizing thin-layer patterning having details with dimensions of 100 nm or even less is described. This process has been called mold lithography. It is a two-step process: First, a photopolymerization-replication step is carried out, after which pattern transfer is realized through, e.g., wet or dry etching into the substrate material. We performed a number of elementary experiments to evaluate this process. Processing conditions are given and the obtained results are discussed. The strengths of this process are its simplicity and low cost while maintaining compatibility with (standard) semiconductor-technology processing.

Review on Micro- and Nanolithography Techniques and their Applications

“…In 1996, nanoimprint lithography was devised through the introduction of a low-viscosity UVcurable monomer as compliant polymer layer in order to enhance fluidity of the embossed material [16]. The process is called UV-nanoimprint as schematically shown in Fig.…”

“…Masked lithography makes use of masks or molds to transfer patterns over a large area simultaneously, thus, enabling a high-throughput fabrication up to several tens of wafers/hr. The forms of masked lithography include photolithography [1][2][3][4][5][6][7][8][9][10], soft lithography [11][12][13], and nanoimprint lithography [14][15][16][17][18][19][20][21]. On the other hand, maskless lithography, such as electron beam lithography [22][23][24][25][26][27][28][29], focused ion beam lithography [30][31][32][33], and scanning probe lithography [34][35][36][37][38][39][40][41][42][43][44], fabricates arbitrary patterns by a serial writing without the use of masks.…”

Suppression of thermal crown of heating roll for large area thermal imprint with consideration of thermal resistance between roll and shaft

“…Imprint lithography has attracted attention for its ability to overcome the disadvantages of photo lithography, such as the difficulty of mass production at low cost and over a large area exposure. Haisma et al (1996) proposed moldassisted nanolithography, which uses a UV-curable polymer. 7 Bender et al (2000) fabricated nanostructures using UV imprint lithography with low pressure and room temperature printing and easy detachment of the mold.…”

“…Haisma et al (1996) proposed moldassisted nanolithography, which uses a UV-curable polymer. 7 Bender et al (2000) fabricated nanostructures using UV imprint lithography with low pressure and room temperature printing and easy detachment of the mold. 8 Ahn et al (2006) fabricated a continuous ultraviolet roll nanoimprint lithography system which achieved thickness uniformity while replicating large-scale nano-and micro-sized patterns.…”

Next-generation lithography – an outlook on EUV projection and nanoimprint

“…The UV-assisted NIL process -in contrast to Chou's thermal NIL -was established at the same time by Jan Haisma from Philips in Eindhoven and nearer to traditional optical lithography because it employed photocurable resists instead of the more general thermoplastic materials [9]. Further developments followed.…”