A two-point central difference algorithm is often used to calculate the derivative of a function. This estimate is only valid over a limited frequency range. Therefore, the algorithm can be modeled as an ideal differentiator in series with a low-pass filter. The filter cutoff frequency is a function of the time between the points. We discuss the accuracy and limitations of using this algorithm on human saccadic eye movement data. To calculate the velocity of saccadic eye movements the algorithm should have a cutoff frequency of 74 Hz or above.
Projection reduction exposure with variable axis immersion lenses (PREVAIL) represents the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner; another e-beam projection approach is SCALPEL pursued by Lucent Technologies. This article discusses the challenges and accomplishments of the PREVAIL project. It will focus on the results obtained with the proof of concept (POC) system. This system was developed to demonstrate key technical building blocks required for high throughput, high resolution e-beam step, and scan projection lithography. The supreme challenge facing all e-beam lithography approaches has been and still is throughput. Since the throughput of e-beam projection systems is severely limited by the available optical field size, the key to success is the ability to overcome this limitation. The PREVAIL technique overcomes field-limiting off-axis aberrations through the use of variable axis lenses, which electronically shift the optical axis simultaneously with the deflected beam, so that the beam effectively remains on axis. This technique developed by IBM has been successfully applied to probe-forming shaped beam systems (EL-4). It had to be modified and extended to provide the larger beam deflections and the wider beam images at the wafer plane used in projection reduction systems. The POC system projects sequentially 1×1 mm2 subfields, selected at the reticle, in 4:1 reduction mode onto the wafer, exposing and resolving patterns of 80 nm lines and spaces in resist; each subfield contains 107 pixels. The deflection capability demonstrated permits electronic selection of 20 1 mm subfields at the reticle and projection of these 20 subfields onto the wafer exposing a field with 5 mm scan length. The resist images provide proof that PREVAIL effectively eliminates off-axis aberrations affecting resolution, since the deflected and undeflected images are indistinguishable. PREVAIL also controls off-axis aberrations affecting placement accuracy of pixels, since distortions of the deflected subfield are corrected to within 12 nm. A high emittance gun has been developed to provide uniform illumination of the patterned subfield, and to fill the large numerical aperture of the projection optics required to significantly reduce beam blur caused by Coulomb interaction.
Electron and ion optical design software for integrated circuit manufacturing equipmentA proof-of-concept ͑POC͒ system was built to prove the electron optics concept of PREVAIL as a viable technology for next generation lithography ͑NGL͒, and is described elsewhere ͑H. C. Pfeiffer et al., J. Vac. Sci. Technology B, these proceedings; W. Stickel et al. ibid., these proceedings͒. The primary objective of the PREVAIL POC system is the embodiment of the curvilinear variable-axis lens ͑CVAL͒ optics which provides superior performance in terms of minimum geometric aberrations over unusually large deflection distances off the system axis ͑see Stickel et al.͒. Another major benefit of the CVAL is the minimization of the Coulomb interaction blur, since this approach permits the reduction of the column length to the smallest practical dimensions. The implementation of the PREVAIL CVAL requires a much higher degree of complexity than that of probe-forming systems, even of those which incorporate variable-axis immersion lenses ͓M. A. Sturans et al., J. Vac. Sci. Technol. B 8, 1682 in the projection optics. The procedure used to establish the proper curvilinear variable-axis trajectory has required the development of hardware and software tools and is semiautomated. In this article we describe the means employed to properly establish the imaging conditions and the curvilinear trajectory of the deflected beam. Proper adjustment of the components is verified by comparison with the theoretically predicted excitation values for the deflection and axis-shifting yokes. Performance results presented by Pfeiffer et al. in terms of image blur and subfield distortion provide the proof of concept for the CVAL imaging conditions.
The IBM/Nikon alliance is developing an EPL stepper alpha tool based on the PREVAIL technology. This article provides a status report on the alliance activity with particular focus on the electron optical subsystem developed at IBM. We have previously described design features of the PREVAIL Alpha system. The state-of-the-art e-beam lithography concepts have since been reduced to practice and turned into functional building blocks of a production level lithography tool. The electron optical subsystem has been designed, built, assembled, and tested at IBM’s Semiconductor Research and Development Center (SRDC) in East Fishkill, NY. After demonstrating subsystem functionality, the column, an interim mechanical system and all associated control electronics hardware and software have been shipped during January 2001 to Nikon’s facility in Kumagaya, Japan, for integration into the Nikon commercial e-beam stepper Alpha tool. Postshipment activity has been directed primarily toward demonstrating subfield stitching, a task which exercises system architecture, calibration, stability, and noise performance.
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