HLA genes play a pivotal role for successful hematopoietic stem cell transplantation (HSCT). There is an increasing need for sophisticated screening of donor HLA genotypes for unrelated HSCT. Next generation sequencing (NGS) has emerged as an alternative for classical Sanger sequence for HLA typing. In this study, HLA‐A, ‐B, and ‐DRB1 alleles were genotyped at the allelic (6‐digit) level using MiSeqDx in 26,202 volunteers from the Korean Network for Organ Sharing. Exon 2 and 3 of HLA‐A and ‐B and exon 2 of HLA‐DRB1 were amplified by polymerase chain reaction (PCR) and each allele was determined by matching the targeted exons and the reference sequence consisting of the IPD‐IMGT/HLA Database. Seventy alleles of HLA‐A, 102 alleles of HLA‐B, and 69 alleles of HLA‐DRB1 were identified. According to common and well‐documented catalogs, 34 alleles in HLA‐A, 61 in HLA‐B, and 45 in HLA‐DRB1 locus were common alleles, and 12, 14, and 11 kinds, were well‐documented alleles, respectively. Thirteen novel alleles including 3 alleles in HLA‐A, 8 alleles in HLA‐B, and 2 alleles in HLA‐DRB1 loci were found. Ten haplotypes with a frequency of more than 1.0% accounted for 22.4% of the total haplotype frequencies. Cis/trans ambiguities of HLA‐A and ‐B loci by combination of exons 2 and 3 were analyzed to be 0.17% of 3 and 3.95% of 22 genotypes, respectively. This information on rare and novel alleles found by accurate HLA typing with NGS may be helpful for unrelated HSCT among Koreans.

Allele frequencies and haplotype frequencies of HLA-A, -B, -C, -DRB1, -DRB3/4/5, -DQA1, -DQB1, -DPA1, and -DPB1 have been rarely reported in South Koreans using unambiguous, phase-resolved next generation DNA sequencing. In this study, HLA typing of 11 loci in 173 healthy South Koreans were performed using next generation DNA sequencing with long-range PCR, TruSight® HLA v2 kit, Illumina MiSeqDx platform system, and Assign™ for TruSight™ HLA software. Haplotype frequencies were calculated using the PyPop software. Direct counting methods were used to investigate the association with DRB1 for samples with only one copy of a particular secondary DRB locus. We compared these allele types with the ambiguous allele combinations of the IPD-IMGT/HLA database. We identified 20, 40, 26, 31, 19, 16, 4, and 16 alleles of HLA-A, HLA-B, HLA-C, HLA-DRB1, HLA-DQA1, HLA-DQB1, HLA-DPA1, and HLA-DPB1, respectively. The number of HLA-DRB3/4/5 alleles was 4, 5, and 3, respectively. The haplotype frequencies of most common haplotypes were as follows: A*33:03:01-B*44:03:01-C*14:03-DRB1*13:02:01-DQB1*06:04:01-DPB1*04:01:01 (2.89%), A*33:03:01-B*44:03:01-C*14:03 (4.91%), DRB1*08:03:02-DQA1*01:03:01-DQB1*06:01:01-DPA1*02:02:02-DPB1*05:01:01 (5.41%), DRB1*04:05:01-DRB4*01:03:01 (12.72%), DQA1*01:03:01-DQB1*06:01:01 (13.01%), and DPA1*02:02:02-DPB1*05:01:01 (30.83%). In samples with only one copy of a specific secondary DRB locus, we examined its association with DRB1. We, thus, resolved 10 allele ambiguities in HLA-B, -C (each exon 2+3), -DRB1, -DQB1, -DQA1, and -DPB1 (each exon 2) of the IPD-IMGT/HLA database. Korean population was geographically close to Japanese and Han Chinese populations in the genetic distances by multidimensional scaling (MDS) plots. The information obtained by HLA typing of the 11 extended loci by next generation sequencing may be useful for more exact diagnostic tests on various transplantations and the genetic population relationship studies in South Koreans.

In addition, plasma plays an important role in many fields including space propulsion and biomedical technology. [4-6] Cathode tubes and plasma generation require an external power supply equipment, however unfortunately this equipment is not portable because of its heavy weight and large volume. Therefore, high voltage applications have severe limitations in harsh environments such as space, battlegrounds, and backcountry, where there is no electricity supply. Triboelectric nanogenerators (TENGs) [7-11] based on a working mechanism of both triboelectrification and electrostatic induction can generate electricity from mechanical movements in our surroundings or human motion without the need for an external power supply. [12-16] Until now, the power generated by TENG has been applied as an energy source for body-implantable medical devices, light-emitting diodes, liquid crystal displays, sensors, and low powerconsuming electronic devices. [11,17-20] Considering self-powered high voltage and portability, TENG can be regarded as an ideal driving source for high voltage applications. In this work, we propose a serrated electrode-based TENG (SE-TENG) that generates ultrahigh power output based on the spark discharge to drive high voltage-operating devices directly. When two different friction materials are in contact and then An ultrahigh power output from a triboelectric nanogenerator (TENG) with a serrated electrode in a low-frequency contact-separation mode which is able to directly drive high voltage-operating devices without the need for an external power supply is demonstrated. When a serrated electrode-based TENG (SE-TENG) is driven, the microstructurally serrated electrode creates a spark discharge in the gap between the serrated electrode and a wire, resulting in tremendously boosted triboelectric power output. Based on the spark discharge phenomenon, a boost adaptor is designed to secondarily boost the triboelectric power output performance, and consequently an ultrahigh triboelectric output voltage of 5 kV and current density of 2 A m −2 are achieved. The boost adaptor concept can be applied to any typical TENG for achieving higher power-generating performance. Finally, two high voltage applications, a Crookes tube and plasma generation, are demonstrated using the SE-TENG and boost adaptor without any external power supply equipment. The ultrahigh power-generating SE-TENG based on the spark discharge phenomenon occurring in the unique electrode structure has considerable potential to operate high voltage applications directly in harsh environments where electricity cannot be supplied.

The kinematics of conventional, rotary chemical mechanical planarization (CMP) was analyzed, and its effect on polishing results was assessed. The authors define a novel parameter, ζ, as a "kinematic number," which includes the effects of wafer size, distance between rotation centers, and rotation ratio between wafer and pad. The analysis result suggests that velocity distribution, direction of friction force, uniformity of velocity distribution, distribution of sliding distance, and uniformity of sliding-distance distribution could be consistently expressed in terms of the kinematic number ζ. These results become more important as the wafer size increases and the requirement of within-wafer nonuniformity is more stringent.

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