After the implementation of the universal two-child policy in 2016, more and more working women have found themselves caught in the dilemma of whether to raise a baby or be promoted, which exacerbates work–family conflicts among Chinese women. Few studies have examined the mediating effect of negative affect. The present study combined the conservation of resources model and affective events theory to examine the sequential mediating effect of negative affect and perceived stress in the relationship between work–family conflict and mental health. A valid sample of 351 full-time Chinese female employees was recruited in this study, and participants voluntarily answered online questionnaires. Pearson correlation analysis, structural equation modeling, and multiple mediation analysis were used to examine the relationships between work–family conflict, negative affect, perceived stress, and mental health in full-time female employees. We found that women’s perceptions of both work-to-family conflict and family-to-work conflict were significant negatively related to mental health. Additionally, the results showed that negative affect and perceived stress were negatively correlated with mental health. The 95% confidence intervals indicated the sequential mediating effect of negative affect and stress in the relationship between work–family conflict and mental health was significant, which supported the hypothesized sequential mediation model. The findings suggest that work–family conflicts affected the level of self-reported mental health, and this relationship functioned through the two sequential mediators of negative affect and perceived stress.
BackgroundStudies on risk preferences have long been of great concern and have examined the neural basis underlying risk‐based decision making. However, studies using conventional transcranial direct current stimulation (tDCS) revealed that bilateral stimulation could change risk propensity with limited evidence of precisely focalized unilateral high‐definition transcranial direct current stimulation (HD‐tDCS). The aim of this experiment was to investigate the effect of HD‐tDCS focalizing the left dorsal lateral prefrontal cortex (DLPFC) on risk‐taking behavior during the Balloon Analogue Risk Task (BART).MethodsThis study was designed as a between‐subject, single‐blind, sham‐controlled experiment. University students were randomly assigned to three groups: the anodal group (F3 anode, AF3, F1, F5, FC3 returned), the cathodal group (F3 cathodal, AF3, F1, F5, FC3 returned) and the sham group. Subsequently, 1.5‐mA 20‐min HD‐tDCS was applied during the BART, and the Positive Affect and Negative Affect Scale (PANAS), the Sensation Seeking Scale‐5 (SSS‐5), and the Behavioral Inhibition System and Behavioral Approach System scale (BIS/BAS) were measured as control variables.ResultsThe cathodal group earned less total money than the sham group, and no significant difference was observed between the anodal group and the sham group.ConclusionsThese results showed that, to some extent, focalized unilateral cathodal HD‐tDCS on left DLPFC could change performance during risky tasks and diminish risky decision making. Further studies are needed to investigate the dose effect and electrode distribution of HD‐tDCS during risky tasks and examine synchronous brain activity to show the neural basis.
Junctionless Low-voltage electric-double-layer (EDL) thin-film transistors (TFTs) gated by solution-processed chitosan dielectric have been fabricated on paper substrate. The operating voltage is found to be as low as 1.0 V due to the large gate specific capacitance (5.4 μF cm−2 at 20 Hz) related to EDL effect induced by mobile ion. The field-effect mobility, subthreshold gate voltage swing and current on/off ratio is estimated to be 2.3 cm2 Vs−1, 110 mV decade−1 and 2 × 105, respectively. The reproducibility of pulse respond and stability of such device are also demonstrated, which indicates that the Junctionless Low-voltage EDL TFT has a potential for flexible electronics.
With the widespread use and increasing cycle life of climbing formwork to construct high-rise buildings in earthquake-prone areas, the risk of earthquakes during the construction period increases. Hence, it is necessary to analyze the seismic response of climbing formwork. According to actual climbing formwork in the super high-rise office building of Wanda Plaza in Kunming, China, the finite element model of the climbing formwork is established on the Ansys platform. The correctness of the model is verified by comparing the natural frequencies of the actual climbing formwork and the finite element model. The time-history analysis of the climbing formwork subjected to earthquakes of varying strong magnitudes is carried out. The maximum displacement position and maximum von Mises stress position of the climbing formwork under different working conditions are determined, and the seismic response of the climbing formwork is analyzed. It has been found that when the formwork is under construction, the maximum displacement position of the climbing formwork is at the center of the long beam of the upper platform, and the maximum von Mises stress position is the joint of the outer pole of the main platform and tripod. Under the climbing condition, the maximum displacement position of the climbing formwork is at the top of the outer pole of the upper platform, and the maximum von Mises stress position is the joint of the beam of the tripod and guide rail. The climbing formwork is partially damaged under the simulated earthquake. However, the displacement is large, and some components have reached the yield state. It is recommended to strengthen the connection between the upper platform and the guide rail and enhance the strength and rigidity of the outer pole and tripod. Climbing formwork is more sensitive to horizontal earthquakes and has minimal sensitivity to vertical earthquakes. The structure attached to the climbing formwork will reduce its sensitivity to earthquakes. The research results are of practical significance for seismic design and improvement of climbing formwork.
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