Silicon nanowires (SiNWs) are known to exhibit a large piezoresistance (PZR) effect, making them suitable for various sensing applications. Here, we report the results of a PZR investigation on randomly distributed and interconnected vertical silicon nanowire arrays as a pressure sensor. The samples were produced from p-type (100) Si wafers using a silver catalyzed top-down etching process. The piezoresistance response of these SiNW arrays was analyzed by measuring their I-V characteristics under applied uniaxial as well as isostatic pressure. The interconnected SiNWs exhibit increased mechanical stability in comparison with separated or periodic nanowires. The repeatability of the fabrication process and statistical distribution of measurements were also tested on several samples from different batches. A sensing resolution down to roughly 1m pressure was observed with uniaxial force application, and more than two orders of magnitude resistance variation were determined for isostatic pressure below atmospheric pressure.

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The present work reports the evolution and growth of GeGaAs(O) polytype nanoislands over GaAs p-type substrate with photoemission application in mind. Several morphological transformations from NIs to simultaneously present nanopits/holes are observed as a function of annealing parameters that is, temperature (350-800 • C) and time (5-90 minutes). Structural and elemental analyses are executed using atomic force microscopy, scanning electron microscopy and energy dispersive X-ray spectroscopy. Photoemission current of the nanostructured surfaces, measured upon exposure from 265 nm light emitting diode, is found to depend on the nanoislands size, which in turn depends on the annealing parameters. A maximum photoelectric emission is obtained for structure annealed at 650 • C for 60 minutes, upon which an increment of roughly two orders of magnitude is observed.

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Silicon nanowires (SiNWs) are known to exhibit large piezoresistance (PZR) effect, making it suitable for various sensing applications. Here, we report the results of a PZR investigation on randomly distributed and interconnected vertical silicon nanowire arrays as a pressure sensor. The samples were produced from p-type (100) Si wafers using a silver catalysed top-down etching process. The piezoresistance response of these SiNW arrays was analysed by measuring their I-V characteristics under applied uniaxial as well as isostatic pressure. The interconnected SiNWs exhibit increased mechanical stability in comparison with separated or periodic nanowires. The repeatability of the fabrication process and statistical distribution of measurements were also tested on several samples from different batches. A sensing resolution down to roughly 1 mbar pressure was observed with uniaxial force application, and more than two orders of magnitude resistance variation was determined for isostatic pressure below atmospheric pressure.